H.c. Starck Gmbh

Steve Miller

Prabhat Kumar

Mark E Gaydos

Gary Alan Rozak

Stefan Zimmermann

Rong-Chein Richard Wu

Norman C Mills

John A Shields

Molybdenum titanium sputter targets are provided. In one aspect, the targets are substantially free of the &#x3b2;(Ti, Mo) alloy phase. In another aspect, the targets are substantially comprised of single phase &#x3b2;(Ti, Mo) alloy. In both aspects, particulate emission during sputtering is reduced. Methods of preparing the targets, methods of bonding targets together to produce large area sputter targets, and films produced by the targets, are also provided.

Methods of making molybdenum titanium sputtering plates and targets

In various embodiments, large-area sputtering targets are formed by providing a plurality of sputtering targets each comprising a backing plate and a refractory metal layer disposed thereon, and spray depositing a refractory metal powder on an interface between the sputtering targets, the refractory metal powder consisting essentially of the same metal as each refractory metal layer, thereby joining the refractory metal layers of the sputtering targets.

Low-energy method for fabrication of large-area sputtering targets

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Canton, MA, United States of America

Steve Miller