At&t Bell Laboratories

At+t Corp.

Stephen W Downey

Adrian B Emerson

Erdmann F Schubert

Richard A Gottscho

James D Sinclair

Rose F Kopf

William D Reents, Jr

Amy J Muller

Anthony M Mujsce

Alka Swanson

Disclosed is an apparatus which can serve to detect, count, size discriminate and analyze the chemical composition of particles in the air or process gases. In a preferred embodiment, the particles enter via a capillary into a differentially pumped chamber. A pulsed laser which is continuously fired is focused at an opening in the chamber. When the particles come into the path of the laser beam, the particles are fragmented and ionized. A dual time of flight mass spectrum is produced, recorded with an oscilloscope and analyzed with a computer. The mass spectrum information enables the determination of the chemical nature and concentration of the species of the particles, the particle size and the elemental composition of airborne particles in real time. Once these parameters are determined the source of the particles can be determined and eliminated from the environment and process. Thus, the inventive apparatus is advantageously used in conjunction with a facility, i.e., a semiconductor manufacturing facility, that requires ultra-clean conditions.

Laser induced mass spectrometry

It has been found that in the preparation of devices having repetitive layers, such as distributed Bragg reflectors, the dopant introduced during processing redistributes itself in a deleterious manner. In particular, this dopant through various effects segregates and diffuses from one layer into the interface region of the second layer. As a result, properties such as electrical resistance of the structure become unacceptably high. By utilizing various expedients such as carbon doping this segregation and its associated deleterious effects are avoided.

Devices having repetitive layers

Gas phase processes such as plasma etching of a semiconductor substrate is monitored by utilizing the optogalvanic effect. The substrate is subjected to light and in response emits an electron current whose magnitude is representative of the composition at the surface of the substrate. The monitored current is a sensitive indication of surface contamination and of compositional changes associated with the gas phase procedure. The technique is effectively utilized in fabricating devices such as semiconductor devices.

Monitoring the fabrication of semiconductor devices by photon induced

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Chatham, NJ, United States of America

Stephen W Downey