Asml Netherlands B.v.

Stephen Peter Morgan

Maurits Van Der Schaar

Kaustuve Bhattacharyya

Arie Jeffrey Den Boef

Michael Kubis

Martin Ebert

Jen-Shiang Wang

Peter Hanzen Wardenier

Andreas Fuchs

Leonardus Henricus Marie Verstappen

Guangqing Chen

Martyn John Coogans

Panagiotis Pieter Bintevinos

Lotte Marloes Willems

Pieter Jacob Mathias Hendrik Knelissen

A method including performing a simulation to evaluate a plurality of metrology targets and/or a plurality of metrology recipes used to measure a metrology target, identifying one or more metrology targets and/or metrology recipes from the evaluated plurality of metrology targets and/or metrology recipes, receiving measurement data of the one or more identified metrology targets and/or metrology recipes, and using the measurement data to tune a metrology target parameter or metrology recipe parameter.

Method and apparatus for inspection and metrology

A method of determining an overlay error. Measuring an overlay target having process-induced asymmetry. Constructing a model of the target. Modifying the model, e.g., by moving one of the structures to compensate for the asymmetry. Calculating an asymmetry-induced overlay error using the modified model. Determining an overlay error in a production target by subtracting the asymmetry-induced overlay error from a measured overlay error. In one example, the model is modified by varying asymmetry p, pand the calculating an asymmetry-induced overlay error is repeated for a plurality of scatterometer measurement recipes and the step of determining an overlay error in a production target uses the calculated asymmetry-induced overlay errors to select an optimum scatterometer measurement recipe used to measure the production target.

Method and apparatus for determining an overlay error

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Son en Breugel, Netherlands

Stephen Peter Morgan