International Business Machines Corporation

Globalfoundries Inc.

Globalfoundries U.S. 2 LLC

Stephen Ellinwood Luce

Anthony K Stamper

Jeffrey P Gambino

Mark David Jaffe

Thomas L McDevitt

Timothy Joseph Dalton

Kerry Bernstein

Edmund Juris Sprogis

Paul David Kartschoke

Timothy Harrison Daubenspeck

James William Adkisson

Robert K Leidy

Hyun K Lee

Richard John Rassel

John Edward Cronin

Mark Charles Hakey

David Louis Harame

William F Clark, Jr

William Thomas Motsiff

James Spiros Nakos

Daniel C Edelstein

Steven H Voldman

Baozhen Li

Alvin Jose Joseph

John Anthony Fitzsimmons

John Joseph Pekarik

Edward Crandal Cooney, Iii

Yun Shi

Kwong Hon Wong

Alan Bernard Botula

Keith Randal Pope

Lee Matthew Nicholson

Paul E Bakeman, Jr

Wilma Jean Horkans

Lloyd G Burrell

John E Heidenreich, Iii

Henry W Trombley

Mark D Levy

Sally J Yankee

Jennifer C Robbins

Mark J Pouliot

Peter D Roper

Thomas Joseph Dalton

Edward E Cooney, Iii

Charles W Koburger, Iii

Zhong-Xiang He

Naftali Eliahu Lustig

Michel J Abou-Khalil

Theodore James Letavic

Donald M Kenney

Robert Michael Geffken

Rosemary A Previti-Kelly

Carter W Kaanta

Dale J Pearson

Jung H Yoon

John R Abernathey

Stephen E Knight

Gary P Viens

Naftall E Lustig

Denis J Poley

Mark David Jaffee

Susan F Cronin

An approach includes a method of fabricating a switch. The approach includes forming a first cantilevered electrode, forming a second cantilevered electrode over an electrode and operable to contact the first cantilevered electrode upon an application of a voltage to the electrode, and forming an arm on the first cantilevered electrode with an extending protrusion extending upward from an upper surface of the arm.

Method of manufacturing MEMS switches with reduced switching voltage

An approach includes a method of fabricating a switch. The approach includes forming a first cantilevered electrode over a first electrode, forming a second cantilevered electrode over a second electrode and operable to directly contact the first cantilevered electrode upon an application of a voltage to at least one of the first electrode and a second electrode, and the first cantilevered electrode includes an arm with an extending protrusion which extends upward from an upper surface of the arm.

MEMS switches and methods of manufacturing MEMS switches is provided. The MEMS switch having at least two cantilevered electrodes having ends which overlap and which are structured and operable to contact one another upon an application of a voltage by at least one fixed electrode.

Method of manufacturing a switch

An approach includes a method of fabricating a switch. The approach includes forming a first cantilevered electrode over a first fixed electrode, forming a second cantilevered electrode with an end that overlaps the first cantilevered electrode, forming a third cantilevered electrode operable to directly contact the first cantilevered electrode upon an application of a voltage to a second fixed electrode, and forming a hermetically sealed volume encapsulating the first fixed electrode, the second fixed electrode, the first cantilevered electrode, and the second cantilevered electrode.

Methods of manufacture for MEMS switches with reduced switching voltage

An approach includes a method of fabricating a switch. The approach includes forming a first cantilevered electrode operable to directly contact a second fixed electrode upon an application of a voltage to a first fixed electrode, forming a second cantilevered electrode with an end that overlaps the first cantilevered electrode, and forming a hermetically sealed volume encapsulating the first fixed electrode, the second fixed electrode, the first cantilevered electrode, and the second cantilevered electrode.

Methods of manufacturing for MEMS switches with reduced switching voltage

An approach includes a method of fabricating a switch. The approach includes forming a fixed electrode, forming a first cantilevered electrode, forming a second cantilevered electrode aligned vertically over the first fixed electrode, and which has an end that overlaps and is operable to directly contact an end of the first cantilevered electrode upon an application of a voltage to the fixed electrode, and forming a hermetically sealed volume encapsulating the first fixed electrode, the second fixed electrode, the first cantilevered electrode, and the second cantilevered electrode.

An approach includes a method of fabricating a switch. The approach includes forming a first fixed electrode and a second fixed electrode, forming a first cantilevered electrode aligned vertically over the first fixed electrode, forming a second cantilevered electrode aligned vertically over the first fixed electrode and which has an end that overlaps the first cantilevered electrode, forming a third cantilevered electrode aligned vertically over the second fixed electrode and operable to directly contact the first cantilevered electrode upon an application of a voltage to the second fixed electrode, and forming a hermetically sealed volume encapsulating the first fixed electrode, the second fixed electrode, the first cantilevered electrode, and the second cantilevered electrode.

Method of manufacture MEMS switches with reduced voltage

An approach includes a method of fabricating a switch. The approach includes forming a first fixed electrode and a second fixed electrode, forming a first cantilevered electrode aligned vertically over the first fixed electrode, forming a second cantilevered electrode aligned vertically over the second fixed electrode, and which has an end that overlaps and is operable to directly contact an end of the first cantilevered electrode upon an application of a voltage to at least one of the first fixed electrode and the second fixed electrode, and forming a hermetically sealed volume encapsulating the first fixed electrode, the second fixed electrode, the first cantilevered electrode, and the second cantilevered electrode.

Method of manufacturing MEMS switches with reduced switching volume

A semiconductor structure and method of manufacture and, more particularly, a field effect transistor that has a body contact and method of manufacturing the same is provided. The structure includes a device having a raised source region of a first conductivity type and an active region below the raised source region extending to a body of the device. The active region has a second conductivity type different than the first conductivity type. A contact region is in electric contact with the active region. The method includes forming a raised source region over an active region of a device and forming a contact region of a same conductivity type as the active region, wherein the active region forms a contact body between the contact region and a body of the device.

Field effect transistor and method of manufacture

An approach includes a method of fabricating a switch. The approach includes forming a first fixed electrode and a second fixed electrode, forming a first cantilevered electrode aligned vertically over the first fixed electrode and the second fixed electrode, and operable to directly contact the second fixed electrode upon an application of a voltage to the first fixed electrode, forming a second cantilevered electrode aligned vertically over the second fixed electrode, and which has an end that overlaps the first cantilevered electrode, and forming a hermetically sealed volume encapsulating the first fixed electrode, the second fixed electrode, the first cantilevered electrode, and the second cantilevered electrode.

Method of manufacturing MEMS switches with reduced voltage

MEMS switches with reduced switching voltage and methods of manufacture

Disclosed are embodiments of a lateral, extended drain, metal oxide semiconductor, field effect transistor (LEDMOSFET) having tapered dielectric field plates positioned laterally between conductive field plates and opposing sides of a drain drift region of the LEDMOSFET. Each dielectric field plate comprises, in whole or in part, an airgap. These field plates form plate capacitors that can create an essentially uniform horizontal electric field profile within the drain drift region so that the LEDMOSFET can exhibit a specific, relatively high, breakdown voltage (Vb). Tapered dielectric field plates that incorporate airgaps provide for better control over the creation of the uniform horizontal electric field profile within the drain drift region, as compared to tapered dielectric field plates without such airgaps and, thereby ensure that the LEDMOSFET exhibits the specific, relatively high, Vb desired. Also disclosed herein are embodiments of a method of forming such an LEDMOSFET.

Lateral extended drain metal oxide semiconductor field effect transistor (LEDMOSFET) with tapered airgap field plates

Bulk acoustic wave filters and/or bulk acoustic resonators integrated with CMOS devices, are provided. The structure includes a single crystalline beam formed from a silicon layer of a silicon on insulator (SOI) substrate; insulator material coating the single crystalline beam; an upper cavity formed above the single crystalline beam, over a portion of the insulator material; a lower cavity formed in lower wafer bonded to an insulator layer of the SOI substrate, below the single crystalline beam and the insulator layer of the SOI substrate; a connecting via that connects the upper cavity to the lower cavity, the connecting via being coated with the insulator material; and a Bulk Acoustic Wave (BAW) filter or Bulk Acoustic Resonator (BAR) in electrical connection with the single crystalline beam.

Integrated semiconductor devices with single crystalline beam, methods of manufacture and design structure

A semiconductor device including at least one capacitor formed in wiring levels on a silicon-on-insulator (SOI) substrate, wherein the at least one capacitor is coupled to an active layer of the SOI substrate. A method of fabricating a semiconductor structure includes forming an SOI substrate, forming a BOX layer over the SOI substrate, and forming at least one capacitor in wiring levels on the BOX layer, wherein the at least one capacitor is coupled to an active layer of the SOI substrate.

Charge breakdown avoidance for MIM elements in SOI base technology and method

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Underhill, VT, United States of America

Stephen Ellinwood Luce