Novellus Systems Incorporated

Paralax, LLC

Stephen E Hilliker

George Thomas

Robert Eugene Weisse

Yan Rubin

Viral Hazari

Zia Karim

Anthony E Sebastian

Sriram Seshagiri

In one embodiment, a system for delivering radio frequency (RF) power to a plasma processing system includes an automatic impedance matching network configured to receive RF power from an RF generator, and a fixed impedance matching network coupled between the automatic impedance matching network and the plasma processing chamber. The fixed impedance matching network may be configured to transform a first impedance presented by the chamber to a second impedance that allows the automatic impedance matching network to operate within a tuning range.

RF delivery configuration in a plasma processing system

In one embodiment, an absorptive filter network is provided between an RF generator and a semiconductor processing reactor. The absorptive filter network includes an absorptive filter circuit which allows energies at a fundamental frequency to pass while absorbing energies at frequencies away from the fundamental frequency. An absorptive filter circuit is located on the reactor-side of the absorptive filter network to isolate the RF generator from the effects of the non-linear loading presented by a plasma in the reactor. Another absorptive filter circuit is located on the RF generator-side of the absorptive filter network to present a stable voltage waveform to the plasma.

Absorptive filter for semiconductor processing systems

An improved vacuum variable capacitor can include one or more characteristics that provide advantages over previous vacuum variable capacitors. In particular, the vacuum variable capacitor can be constructed so as to enable the capacitance to be adjusted more easily, reduce parasitic electrical characteristics that degrade the performance of the vacuum variable capacitor, increase the strength of the capacitor plates of the vacuum variable capacitor, reduce the size of the vacuum variable capacitor, and/or make the shape of the vacuum variable capacitor more easily integrated into a system of which the vacuum variable capacitor is part.

Vacuum variable capacitor

A plasma-enhanced chemical vapor deposition system includes a balancing inductor in the circuit path between the radio frequency generator and the &ldquo;showerhead&rdquo; that is used to introduce reactant gases to the system. The balancing inductor reduces the resonant frequency of the circuit to a level below the frequency of the signal produced by the radio frequency generator. Since the effective capacitance of the showerhead electrode varies monotonically with the power input to the plasma, fluctuations in the power delivered to the plasma will be self-correcting the system will be stabilized. For example, a drop in the power to the plasma will reduce the resonant frequency, but the corresponding reduction in the effective capacitance of the showerhead electrode will tend to increase the resonant frequency, thereby offsetting the change and stabilizing the system. Systems according to this invention are particularly useful in solving the plasma stability problems of using NF,or a mixture of NF,and one or more inert gases for the in situ cleaning of PECVD chambers used for depositing dielectric films.

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Bonita, CA, United States of America

Stephen E Hilliker