The University of Texas System

Molecular Imprints, Inc.

Stephen C Johnson

Sidlgata V Sreenivasan

Byung Jin Choi

Byung-Jin Choi

Niyaz Khusnatdinov

Yukio Nishimura

Pankaj B Lad

Philip D Schumaker

C Grant Willson

Van Nguyen Truskett

Logan L Simpson

Christopher Ellis Jones

Sidigata V Sreenivasan

Frank Palmieri

Michael D Stewart

In nano-imprint lithography it is important to detect thickness non-uniformity of a residual layer formed on a substrate. Such non-uniformity is compensated such that a uniform residual layer may be formed. Compensation is performed by calculating a corrected fluid drop pattern.

Residual layer thickness measurement and correction

Systems and methods for calibrating a dispense head to provide substantially uniform droplets on a substrate are described.

Fluid dispense device calibration

An apparatus to control displacement of a body spaced-apart from a surface includes a flexure system having a first flexure member defining a first axis of rotation and a second flexure member defining a second axis of rotation. A body is coupled to the flexure system to move about a plurality of axes. An actuation system is coupled to the flexure system to selectively constrain movement of the body along a subset of the plurality of axes.

Remote center compliant flexure device

In some embodiments, the present invention is directed to methods that involve the combination of step-and-flash imprint lithography (SFIL) with a multi-tier template to simultaneously pattern multiple levels of, for example, an integrated circuit device. In such embodiments, the imprinted material generally does not serve or act as a simple etch mask or photoresist, but rather serves as the insulation between levels and lines, i.e., as a functional dielectric material. After imprinting and a multiple step curing process, the imprinted pattern is filled with metal, as in dual damascene processing. Typically, the two printed levels will comprise a 'via level,' which is used to make electrical contact with the previously patterned under-level, and a 'wiring level.' The present invention provides for the direct patterning of functional materials, which represents a significant departure from the traditional approach to microelectronics manufacturing.

Use of step and flash imprint lithography for direct imprinting of dielectric materials for dual damascene processing

Apparatus to control displacement of a body spaced-apart from a surface

The present invention includes a method of orientating a template with respect to a substrate spaced from the template, the method including, rotating the template about a first and a second axis to orientate the template with respect to the substrate and maintain the orientation in response to a force being exerted upon the template.

Method of orientating a template with respect to a substrate in response to a force exerted on the template

A method to control a relative position between a surface and a body to form a pattern in the surface that features moving a body to obtain a desired relationship between the surface and the body. To that end, the method includes sensing the surface and the body and moving that body to obtain a desired spatial relationship with the surface.

Method to control the relative position between a body and a surface

An apparatus to orientate a body with respect to a surface spaced-apart from the body. The apparatus comprises a flexure system having a first flexure member defining a first axis of rotation and a second flexure member defining a second axis of rotation. A body is coupled to the flexure system, and an actuation system is coupled to the flexure system. The body is coupled to the flexure system to rotate about the first and the second axes in response to movement caused by the actuation system. The movement of the body about the first axis being decoupled from movement of the body about the second axis.

Apparatus to orientate a body with respect to a surface

Processes and associated devices for high precision positioning of a template an substrate during imprint lithography includes a calibration system with a course calibration stage and a fine orientation stage capable of maintaining a uniform gap between the template and substrate. The fine orientation stage includes a pair of flexure members having flexure joints for motion about a pivot point intersected by first and second orientation axes. Actuators lengthen or shorten to expand or contract the flexure members. Separation of the template is achieved using a peel-and-pull method that avoids destruction of imprinted features from the substrate.

Growing community of inventors

Austin, TX, United States of America

Stephen C Johnson