Fujifilm Electronic Materials U.s.a., Inc.

Arch Specialty Chemicals, Inc.

Arch Speciality Chemicals, Inc.

Stephanie J Dilocker

Sanjay Malik

Binod B De

Ognian N Dimov

Raj Sakamuri

William A Reinerth

Andrew J Blakeney

Ahmad A Naiini

Ashok Reddy

John Ferri

Jeffery Eisele

Michaela Connell

This disclosure relates to a dielectric film-forming composition that includes at least one cyclized polydiene resin, and one or both of at least one reactive functional compound and at least one catalyst.

Dielectric film-forming composition

This disclosure describes a process of generating a planarizing polyimide based dielectric film on a substrate with conducting metal pattern, wherein the process comprised steps of: (a) providing a dielectric film forming composition comprising at least one fully imidized polyimide polymer and at least one solvent; and (b) depositing the dielectric film forming composition onto a substrate with conducting metal pattern to form a dielectric film, wherein the difference in the highest and lowest points on a top surface of the dielectric film is less than about 2 microns.

Planarizing process and composition

An etch resistant thermally curable Underlayer composition for use in a multiplayer lithographic process for producing a photolithographic bilayer coated substrate, the composition being a composition of: 

Thermally cured underlayer for lithographic application

Novel copolymers suitable for forming the top layer photoimagable coating in a deep U V. particularly a 193 nm and 248 nm, bilayer resist system providing high resolution photolithography. Chemically amplified photoresist composition and organosilicon moieties suitable for use in the binder resin for photoimagable etching resistant photoresist composition that is suitable as a material for use in ArF and KrF photolithography using the novel copolymers.

Copolymer, photoresist compositions thereof and deep UV bilayer system thereof

Acetal protected polymers and photoresists compositions thereof

Process for producing anhydride-containing polymers for radiation sensitive compositions

A photoresist composition comprising at least one acetal polymer having a silicon substituent; provided that the silicon substituent is not directly attached to the acetal functionality, thereby providing high resolution, improved DOF, and improved dimensional stability under metrology conditions.

Silicon-containing acetal protected polymers and photoresists compositions thereof

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East Providence, RI, United States of America

Stephanie J Dilocker