Asml Netherlands B.v.

Stephane Martel

Pieter-Jan Van Zwol

Paul Janssen

Maxim Aleksandrovich Nasalevich

Dennis De Graaf

Michael Alfred Josephus Kuijken

Jan Hendrik Willem Kuntzel

Thijs Kater

Guido Salmaso

Maxime Biron

Kevin Kornelsen

Richard Beaudry

A wafer including a mask on one face and at least one layer on an opposite face, wherein the mask has at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle, the method including: providing a wafer having a mask on one face and at least one layer on an opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle, the method including: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may include a metal nitride layer.

Pellicle for EUV lithography

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Bromont, Canada

Stephane Martel