Heraeus Quarzglas Gmbh & Co Kg

Heraeus Quarzglas Gmbh

Shin-etsu Quartz Products Co., Ltd.

Stephan Thomas

Klaus Becker

Martin Trommer

Heinz Fabian

Jan Vydra

Stefan Ochs

Walter Lehmann

Michael Hünermann

Andreas Langner

Michael Huenermann

Stefan Hengster

Shigeru Yamagata

Kyoichi Inaki

Bodo Kühn

Ralf Takke

Steffen Kaiser

Toshikatu Matsuya

Bruno Uebbing

A method for homogenizing glass includes the method: providing a cylindrical blank composed of the glass having a cylindrical outer surface that extends along a longitudinal axis of the blank between a first end face and a second end face, forming a shear zone in the blank by softening a longitudinal section of the blank and subjecting it to a thermal-mechanical intermixing treatment, and displacing the shear zone along the longitudinal axis of the blank. The displacement of the shear zone along the longitudinal axis of the blank is superimposed by a simultaneous oscillating motion of the shear zone along the longitudinal axis of the blank. The first end of the blank is rotated at a first rotational speed and the second end of the blank is rotated at a second rotational speed. An oscillating motion of the shear zone is generated by periodically varying the first and/or second rotational speed.

Method for homogenizing glass

A method for homogenizing glass includes the method: providing a cylindrical blank composed of the glass having a cylindrical outer surface that extends along a longitudinal axis of the blank between a first end face and a second end face, forming a shear zone in the blank by softening a longitudinal section of the blank and subjecting it to a thermal-mechanical intermixing treatment, and displacing the shear zone along the longitudinal axis of the blank. To enable a radial mixing within the shear zone in addition to the tangential mixing with the lowest possible time and energy input, starting from this method, cylindrical sections of the blank are adjacent to the shear zone on both sides, the first cylindrical section having a first central axis and the second cylindrical section having a second central axis, the first central axis and the second central axis being temporarily non-coaxial with each other.

A known method for homogenizing glass includes the following steps: providing a cylindrical blank composed of the glass, having a cylindrical outer surface which extends between a first end face and a second end face, forming a shear zone in the blank by softening a longitudinal section of the blank and subjecting it to a thermal-mechanical intermixing treatment, and moving the shear zone along the longitudinal axis of the blank. To reduce the risk of cracks and fractures during homogenizing, it is proposed that a thermal radiation dissipator is used that at least partially surrounds the shear zone, the lateral dimension of which in the direction of the longitudinal axis of the blank is greater than the shear zone and smaller than the length of the blank, the thermal radiation dissipator being moved synchronously with the shear zone along the longitudinal axis of the blank.

Method and device for homogenizing glass

A substrate for an EUV mirror which contains a zero crossing temperature profile that departs from the statistical distribution is provided. A method for producing a substrate for an EUV mirror is also provided, in which the zero crossing temperature profile in the substrate is adapted to the operating temperature of the mirror. A lithography method using the substrate is also described.

Mirror blank for EUV lithography without expansion under EUV radiation

A method for producing titanium-doped synthetic quartz glass includes: The liquid SiOfeedstock material comprises at least one additional component made of the polyalkylsiloxane D3 having a weight fraction of mD3 and one additional component made of the polyalkylsiloxane D5 having a weight fraction of mD5 at a weight ratio of mD3/mD5 in a range of 0.01 to 1, and the liquid SiOfeedstock material provided is evaporated while maintaining the weight ratio of mD3/mD5 and at least 99% by weight thereof are evaporated to form the gaseous SiOfeedstock vapor.

Method for producing titanium-doped synthetic quartz glass

The Tiions present in Ti-doped silica glass cause a brown staining of the glass, causing inspection of the lens to become more difficult. Known methods for reducing Tiions in favor of Tiions in Ti-doped silica glass include a sufficiently high proportion of OH-groups and carrying out an oxygen treatment prior to vitrification, which both have disadvantages. In order to provide a cost-efficient production method for Ti-doped silica glass, which at a hydroxyl group content of less than 120 ppm shows an internal transmittance (sample thickness 10 mm) of at least 70% in the wavelength range of 400 nm to 1000 nm, the TiO&#x2014;SiOsoot body is subjected to a conditioning treatment with a nitrogen oxide prior to vitrification. The blank produced in this way from Ti-doped silica glass has the ratio Ti/Ti5&#xd7;10.

Method for producing titanium-doped silica glass for use in EUV lithography and blank produced in accordance therewith

A blank made of titanium-doped silica glass for a mirror substrate for use in EUV lithography is provided. The blank includes a surface portion to be provided with a reflective film and having an optically used area (CA) over which a coefficient of thermal expansion (CTE) has a two-dimensional inhomogeneity (dCTE) distribution profile averaged over a thickness of the blank. A maximum inhomogeneity (dCTE) of less than 5 ppb/K is defined as a difference between a CTE maximum value and a CTE minimum value. The dCTEis at least 0.5 ppb/K. The CA forms a non-circular area having a centroid. The dCTE distribution profile is not rotation-symmetrical and is defined over the CA, such that straight profile sections normalized to a unit length and extending through the centroid of the area yield a dCTE family of curves forming a curve band with a bandwidth of less than 0.5&#xd7;dCTE.

Blank made of titanium-doped silica glass and method for the production thereof

A blank of TiO&#x2014;SiOglass for a mirror substrate for use in EUV lithography has a low need for adaptation to optimize the progression of the coefficient of thermal expansion, and consequently also the progression of the zero crossing temperature T. The TiO&#x2014;SiOglass has at a mean value of the fictive temperature Tin the range between 920&#xb0; C. and 970&#xb0; C. a dependence expressed as the differential quotient dT/dTof its zero crossing temperature Ton the fictive temperature Tof less than 0.3.

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Starting from an optical component of quartz glass for transmitting ultraviolet radiation of a wavelength between 190 nm and 250 nm, with a glass structure essentially without oxygen defects, a hydrogen content ranging from 0.1&#xd7;10molecules/cmto 5.0&#xd7;10molecules/cm, and with a content of SiH groups of less than 5&#xd7;10molecules/cm, to provide such a component which is particularly well suited for use with linearly polarized UV laser radiation, the present invention suggests that the component should have a content of hydroxyl groups ranging from 10 to 250 wt ppm and a fictive temperature above 1000&#xb0; C.

Optical component of quartz glass, method for producing the optical component, and use thereof

The present invention relates to a quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, and to a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter. Moreover, the invention relates to a procedure for manufacture of the quartz glass blank. A quartz glass blank of the described type should show little induced absorption and be optimized with respect to compaction and decompaction. The quartz glass blank according to the invention is characterized by the following properties: In the use according to the invention, the quartz glass blank complies with dimensioning rules (2), (3), and (4) in terms of its minimal and maximal hydrogen contents and OH-content, C, C, and C, respectively, with P being the pulse number and &#x3b5; being the energy density (in mJ/cm):[molecules/cm]=1&#xd7;10&#x3b5;,&#x2003;&#x2003;(2)[molecules/cm]=2&#xd7;10&#x3b5;,&#x2003;&#x2003;(3)[wt-ppm]=1,700&#xd7;&#x3b5;[mJ/cm]&#xb1;50.&#x2003;&#x2003;(4)The procedure according to the invention is characterized in that a mixed quartz glass is generated from a first and a second quartz glass by mixing the two quartz glasses in the course of a homogenization treatment.

Quartz glass blank for an optical component, and manufacturing procedure and use thereof

The invention relates to lenses, prisms or other optical members which are subjected to high-power ultraviolet light having a wavelength of about 360 nm or less, or ionizing radiation, particularly optical members for use in laser exposure apparatus for lithography, and to blanks for such optical members. The homogeneity of the refractive index distribution and the resistance to optical deterioration when the optical members are exposed for a long period of time to short wavelength ultraviolet light from a laser beam are improved. The optical members are made of high-purity synthetic silica glass material containing at least about 50 wt. ppm of OH groups, and are doped with hydrogen. The refractive index distribution caused by the fictive temperature distribution during heat treatment in the process of producing high-purity silica glass blanks for optical members in accordance with the present invention is offset by the combined refractive index distribution determined by the OH group concentration distribution or by the OH group concentration distribution and the Cl concentration distribution in the glass.

Optical members and blanks of synthetic silica glass and method for

A component for the transmission of light of high energy density with a wavelength between 250 nm and 400 nm is made of synthetic, high-purity fused vitreous silica having a hydroxyl ion content in the range between 50 ppm and 1200 ppm and an under-stoichiometric content of oxygen for the achievement of a minimal transmission variation in the transmission of the light.

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Grosskrotzenburg, Germany

Stephan Thomas