Sony Corporation

Materials Research Corporation

Stephan Schittny

Michael Scott Goldstein

John A Dunlop

Cari Shim

Gerald B Feldewerth

A target for sputtering is subjected to a surface treatment process and special packaging after target manufacture for improved sputtering performance and process and yield by reducing particulates. The sputtering target is first surface treated to remove oxides, impurities and contaminants. The surface treated target is then covered with a metallic enclosure and, optionally, a passivating barrier layer. The metallic enclosure protects the target surface from direct contact with subsequently employed packaging material such as plastic bags, thereby eliminating sources of organic materials during sputtering operations. The surface treatment of the target removes deformed material, smearing, twins, or burrs and the like from the target surface, reducing 'burn-in' or sputter conditioning time prior to production sputtering of thin films.

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Phoenix, AZ, United States of America

Stephan Schittny