Basf Se Corporation

Ciba Specialty Chemicals Corporation

Ciba-geigy Corporation

Stephan Ilg

Pascal Hayoz

Jean-Luc Birbaum

Reinhard Schulz

Jean-Pierre Wolf

André Fuchs

Norbert Munzel

Heinz Holzwarth

Peter Nesvadba

Manfred Rembold

Hitoshi Yamato

Toshikage Asakura

Andreas Mühlebach

Reinhard Sommerlade

Rinaldo Hüsler

Souâd Boulmaâz

Andreas Muehlebach

Erich Nyfeler

Jens Möller

Attila Latika

Edith Pighetti

Jens Moeller

The present invention provides a process for imparting decreased adhesion of biological material to the surface of a substrate comprises the following steps (i) oxidizing the surface of the substrate (ii) applying a composition comprising one or more ethylenically unsaturated compounds to the oxidized surface of the substrate and (iii) curing the composition in order to form a coating layer.

Substrates with biopassive coating

The invention relates to a process for the production of strongly adherent coatings on an inorganic or organic substrate, wherein in a first step a) a low-temperature plasma, a corona discharge or a flame is caused to act on the inorganic or organic substrate, in a second step b) one or more defined photoinitiators or mixtures of defined photoinitiators with monomers, containing at least one ethylenically unsaturated group, or solutions, suspensions or emulsions of the afore-mentioned substances, are applied, preferably at normal pressure, to the inorganic or organic substrate, in a third step c) using suitable methods those afore-mentioned substances are dried and/or irradiated with electromagnetic waves and, optionally, in a fourth step d) on the substrate so pretreated is applied a further coating.

Process for the production of strongly adherent coatings

Compounds of the formula (I), L, L', L&#x2033;, L, L&#x2032;, L&#x2033;, L, L&#x2032;, L&#x2033;, L, L&#x2032;, L&#x2033;, L, L&#x2032;, L&#x2033;, L, L&#x2032;, L&#x2033;, L, L&#x2032;, L&#x2033;, L, L&#x2032;, L&#x2033;, L, L&#x2032;and L&#x2033;independently of one another are hydrogen or an organic substituent; and/or one or more of the pairs Land L, L&#x2032;and L&#x2032;or L&#x2033;and L&#x2033;together denote a single bond, provided that the respective X, X&#x2032; or X&#x2033; is not a single bond; and/or Land L, L&#x2032;and L&#x2032;or L&#x2033;and L&#x2033;together denote an organic linking group; and/or one or more of the pairs Land L, Land L, Land L, L&#x2032;and L&#x2032;, L&#x2032;and L&#x2032;, L&#x2032;and L&#x2032;, L&#x2033;and L&#x2033;, L&#x2033;and L&#x2033;, or L&#x2033;and L&#x2033;, together denote an organic linking group; provided that at least one of L, L&#x2032;, L&#x2033;, L, L&#x2032;, L&#x2033;, L, L&#x2032;, L&#x2033;, L, L&#x2032;, L&#x2033;, L, L&#x2032;, L&#x2033;, L, L&#x2032;, L&#x2033;, L, L&#x2032;, L&#x2033;, L, L&#x2032;, L&#x2033;, L, L&#x2032;and L&#x2033;is other than hydrogen; X, X&#x2032; and X&#x2033; independently of one another are a single bond, CRRO, S, NRor NCOR; R, Rand Rindependently of one another are hydrogen or an organic substituent; and Y is an inorganic or organic anion; are suitable as photolatent acid generators. 

Sulphonium salt initiators

Compounds of the formula (I), wherein L, L, Land Lindependently of one another are hydrogen or an organic substituent; R is for example C-Calkyl, C-Ccycloalkyl, C-Calkenyl, substituted C-Calkyl; X is O, S, NRor NCOR; Ris for example hydrogen or C-Calkyl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators. 

Sulphonium salt photoinitiators

Compounds of the formula (I), (II), (III), (IV) and wherein, R is hydrogen, C-Calkyl; C-Calkyl interrupted by one or more O; is -L-X&#x2014;Ror -L-R; Rhas for example one of the meanings as given for R; Ris a monovalent sensitizer or photoinitiator moiety; Arand Arfor example independently of one another are phenyl substituted by C-Calkyl, halogen or OR; or are unsubstituted naphthyl, anthryl, phenanthryl or biphenylyl; or are naphthyl, anthryl, phenanthryl or biphenylyl substituted by C-Calkyl, OH or OR; or are &#x2014;Ar-A-Ar; Aris unsubstituted phenyl naphthyl, anthryl, phenanthryl or biphenylyl; or is phenyl, naphthyl, anthryl, phenanthryl or biphenylyl substituted by C-Calkyl, ORor benzoyl; Aris phenylene, naphthylene, anthrylene or phenanthrylene; A is a direct bond, S, O or C-Calkylene; X is CO, C(O)O, OC(O), O, S or NR; L is C-Calkylene or C-Calkylene interrupted by one or more O; Ris C-Calkyl or C-Chydroxyalkyl; and Y is an anion, are suitable as photolatent acid generators. 

The invention relates to a radiation curable coating or an ink composition comprising a photoinitiator and a stabilizer blend of a sterically hindered nitroxyl radical and a quinone methide.

In-can stabilizer blend

The Invention relates to novel ketones of formulae (I) and (II) wherein R, R, Rand Rare, for example, C-Calkyl, Ris, for example, hydrogen, A is CI, Br, -0-R, &#x2014;NRRor &#x2014;S&#x2014;R, A' is &#x2014;O&#x2014;, &#x2014;NH&#x2014; or &#x2014;NR&#x2014;, X and Y are each independently of the other &#x2014;O&#x2014;Ror &#x2014;N(R)(R), n is an integer from 1 to 10, Ris, for example, an n-valent radical of linear or branched C-Calkyl the carbon chain of which may be interrupted by cyclohexanediyl, phenylene, &#x2014;CH(OH)&#x2014;, &#x2014;C(CH)(CH&#x2014;CH&#x2014;OH)&#x2014;, &#x2014;C(CH)(CH&#x2014;CH&#x2014;OH)&#x2014;, &#x2014;C(CH&#x2014;CH&#x2014;OH)&#x2014;, &#x2014;N(CH)&#x2014;, &#x2014;N(CH)&#x2014;, &#x2014;N(CH&#x2014;CH&#x2014;OH)&#x2014;, &#x2014;CO&#x2014;O&#x2014;, &#x2014;O&#x2014;CO&#x2014;, &#x2014;P(CH&#x2014;CH&#x2014;OH)&#x2014;, &#x2014;P(O)(CH&#x2014;CH&#x2014;OH)&#x2014;, -0-P(O&#x2014;CH&#x2014;CH&#x2014;OH)&#x2014;O&#x2014;, -0-P(O)(0-CH&#x2014;CH&#x2014;OH)&#x2014;O&#x2014;, &#x2014;O-cyclohexanediyl-C(CH)-Cyclohexanediyl-O&#x2014;, &#x2014;O-phenylene-C(CH)-phenylene-O&#x2014;, &#x2014;O-phenylene-CH-phenylene-O&#x2014;, &#x2014;Si(CH)&#x2014;, -0-Si(CH)&#x2014;O&#x2014;, &#x2014;O&#x2014;Si(CH)(0-CH)&#x2014;O&#x2014;, &#x2014;Si(CH)(R)&#x2014;O&#x2014;Si(CH)(R)&#x2014;, 5-(2-hydroxyethyl)-[1,3,5]triazinane-2,4,6-trione-1,3-diyl and/or by from one to nine oxygen atoms. 

Trifunctional photoinitiators

Iodonium salts as latent acid donors

The invention relates to the use of oxime sulfonates of formula 1 ##STR1## wherein R is naphthyl, ##STR2## Ar is an unsubstituted aryl group or an aryl group which carries one or more than one substituent selected from the group consisting of nitro, chloro, bromo, hydroxyl, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 perfluoroalkyl, C.sub.1 -C.sub.4 alkoxy and acid degradable substituent;

High resolution i-line photoresist of high sensitivity

The invention relates to the use of oxime sulfonates of formula 1 ##STR1## wherein R is naphthyl, ##STR2## Ar is an unsubstituted aryl group or an aryl group which carries one or more than one substituent selected from the group consisting of nitro, chloro, bromo, hydroxyl, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 perfluoroalkyl, C.sub.1 -C.sub.4 alkoxy and acid degradable substituents;

The preparation of abrasives, especially abrasive papers and abrasive fabrics, is improved by using an epoxy resin in conjunction with a cationic photoinitiator as binder for the abrasive particles. The binder is cured by irradiation with shortwave light and subsequent heating. The process is distinguished by low curing temperatures and brief curing times.

Growing community of inventors

Giebenach, Switzerland

Stephan Ilg