Globalwafers Co., Ltd.

Corner Star Limited

Memc Electronic Materials, Inc.

Stephan Haringer

Roberto Scala

Marco Zardoni

Hariprasad Sreedharamurthy

Marco D'Angella

Richard Joseph Phillips

Mauro Diodà

Giorgio Agostini

William L Luter

Nan Zhang

Yu-Chiao Wu

Luigi Bonanno

Giancarlo Zago

Gianni Dell'Amico

Armando Giannattasio

Valentino Moser

Franco Battan

Carissima Marie Hudson

John D Holder

Steven Lawrence Kimbel

Harold W Korb

Salvador Zepeda

James Dean Eoff

Martin Jeffrey Binns

Christopher Vaughn Luers

Renzo Odorizzi

Jesse Samsonov Appel

Ugo Delpero

Yu-Chaio Wu

Methods for producing a single crystal silicon ingot are disclosed. The ingot is doped with boron using solid-phase boric acid as the source of boron. Boric acid may be used to counter-dope the ingot during ingot growth. Ingot puller apparatus that use a solid-phase dopant are also disclosed. The solid-phase dopant may be disposed in a receptacle that is moved closer to the surface of the melt or a vaporization unit may be used to produce a dopant gas from the solid-phase dopant.

Methods for producing a single crystal silicon ingot using boric acid as a dopant

Ingot puller apparatus that use a solid-phase dopant

Crystal pulling systems having a fluid-cooled exhaust tube are disclosed. The fluid-cooled exhaust tube extends through the reactor housing and into the reaction chamber. In some embodiments, the exhaust tube extends through the bottom of the crystal puller housing and through a bottom heat shield within the ingot puller housing.

Crystal pulling systems having fluid-filled exhaust tubes that extend through the housing

Methods for growing a single crystal silicon ingot are disclosed. A dynamic state chart that monitors a plurality of ingot growth parameters may be produced and used during production of single crystal silicon ingots. In some embodiments, the dynamic state chart is a dynamic circle map chart having a plurality of sectors with each sector monitoring an ingot growth parameter.

Production and use of dynamic state charts when growing a single crystal silicon ingot

Methods for producing a single crystal silicon ingot using boric acid as a dopant and ingot puller apparatus that use a solid-phase dopant

Additive feed systems for feeding at least two different additives to silicon disposed within a crucible of an ingot puller apparatus are disclosed. The additive feed system may include first and second feed trays which are caused to vibrate to move first or second additive from a canister in which the additive is stored to another vessel in which the amount of first or second additive added to the vessel is sensed. The additive is discharged from the vessel into an additive feed tube through which the additive enters the crucible.

Additive feed systems, ingot puller apparatus and methods for forming a single crystal silicon ingot with use of such additive feed systems

A method of growing a doped monocrystalline ingot using a crystal growing system is provided. The crystal growing system includes a growth chamber, a dopant feeding device, and a feed tube. The method includes preparing a melt of semiconductor or solar-grade material in a crucible disposed within the growth chamber, introducing a solid dopant into the feed tube with the dopant feeding device, melting the solid dopant within the feed tube to a form a liquid dopant, introducing the liquid dopant into the melt below a surface of the melt, and growing a monocrystalline ingot from the melt by contacting the melt with a seed crystal and pulling the seed crystal away from the melt.

System for introducing dopant into a melt of semiconductor or solar-grade material via a feed tube

A crystal pulling apparatus for producing an ingot is provided. The apparatus includes a furnace and a gas doping system. The furnace includes a crucible for holding a melt. The gas doping system includes a feeding tube, an evaporation receptacle, and a fluid flow restrictor. The feeding tube is positioned within the furnace, and includes at least one feeding tube sidewall, a first end through which a solid dopant is introduced into the feeding tube, and an opening opposite the first end through which a gaseous dopant is introduced into the furnace. The evaporation receptacle is configured to vaporize the dopant therein, and is disposed near the opening of the feeding tube. The fluid flow restrictor is configured to permit the passage of solid dopant therethrough and restrict the flow of gaseous dopant therethrough, and is disposed within the feeding tube between the first end and the evaporation receptacle.

Gas doping systems for controlled doping of a melt of semiconductor or solar-grade material

Methods of introducing dopant into a melt of semiconductor or solar-grade material via a feed tube

Ingot puller apparatus for preparing silicon ingots that include a dopant feed system are disclosed. The dopant feed system include a dopant conduit having a porous partition member disposed across the dopant conduit. Solid dopant falls onto the partition member where it sublimes. The sublimed dopant is carried by inert gas through the partition member to contact and dope the silicon melt.

Ingot puller apparatus that include a doping conduit with a porous partition member for subliming solid dopant

Methods for preparing a doped ingot

A system for growing silicon crystal structures includes a housing defining a growth chamber and a feed system connected to the housing for delivering silicon particles to the growth chamber. The feed system includes a container for holding the silicon particles. The container includes an outlet for discharging the silicon particles. The feed system also includes a channel connected to the outlet such that silicon particles discharged from the container flow through the channel. The feed system further includes a separation valve connected to the channel and to the housing. The separation valve is configured such that a portion of the feed system rotates relative to the housing.

Feed system for crystal pulling systems

Methods for controlled doping of a melt including introducing liquid dopant below a surface of the melt

Growing community of inventors

Ciardes, Italy

Stephan Haringer