Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.

Fraunhofer-ges. Zur Förderung Der Angewandten Forschung E.v.

Steffen Straach

Nicolas Schiller

Matthias Fahland

Manfred Neumann

Christoph Charton

Mario Krug

Siegfried Schiller

Henry Morgner

Steffen Günther

Björn Meyer

Mathias Räbisch

Sebastian Bunk

Mathias Raebisch

Thomas KÜHNEL

Waldemar SCHÖNBERGER

Alexander SCHÖNBERGER

The invention relates to a method for producing an ultrabarrier layer system through vacuum coating a substrate with a layer stack that is embodied as an alternating layer system of smoothing layers and transparent ceramic layers, but comprising at least one smoothing layer between two transparent ceramic layers, which are applied by sputtering, in which during the deposition of the smoothing layer a monomer is admitted into an evacuated coating chamber in which a magnetron plasma is operated.

Method for the production of an ultra barrier layer system

The invention relates to a device for the plasma activated vapor coating of large-surface moved substrates, comprising at least one vacuum recipient, one pump system, one evaporator, one device for holding and transporting the substrates to be coated and at least one arc discharge plasma source, whereby at least one device for generating a magnetic field is included, which device can generate a magnetic field between the evaporator and the substrate, the field lines of which magnetic field are aligned approximately perpendicular to the movement direction and parallel to the transport plane of the substrate, and at least one arc discharge plasma source is arranged such that the axis of the arc discharge plasma source is aligned approximately perpendicular to the field lines of the magnetic field.

Device for plasma-activated vapor coating of large surfaces

The invention relates to a method for vapor-depositing strip-shaped substrates with a transparent barrier layer made of aluminum oxide by reactively vaporizing aluminum and admitting reactive gas in a strip vapor-deposition installation. The invention provides that, before coating with aluminum oxide, a partially enclosed layer made of a metal or of a metal oxide is applied to the substrate by magnetron sputtering.

Method of vapor-depositing strip-shaped substrates with a transparent barrier layer made of aluminum oxide

Process for producing organically modified oxide, oxynitride or nitride

Growing community of inventors

Dresden, Germany

Steffen Straach