Carl-Zeiss-Smt Ag

Steffen Lauer

Ulrich Wegmann

Wolfgang Emer

Martin Schriever

Harald Sakowski

A method of determining at least one optical property of a projection exposure system is described, wherein the exposure system includes a beam delivery system having a light source for generating an exposure optical beam having light of a first wavelength (&#x3bb;) and a second wavelength (&#x3bb;), wherein a first ratio is defined as an intensity of light &#x3bb;to an intensity of light &#x3bb;in the exposure optical beam. The method includes supplying at least one measuring optical beam including light of at least &#x3bb;to the projection optical system, detecting wavefronts having traversed the projection optical system, and determining an optical property in dependence of the detected wavefronts, wherein a second ratio of an intensity of light of &#x3bb;to an intensity of light of &#x3bb;in the measuring optical beam being incident on the detector of the wavefront detection system is less than the first ratio.

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Aalen, Germany

Steffen Lauer