Tokyo Electron Limited

Infineon Technologies Ag

Steffen Hornig

Kousuke Yoshihara

Toshinobu Furusho

Takahiro Ookubo

Yusuke Yamamoto

Kay Lederer

A chemical supply system comprises: a first container and a second container for storing a chemical solution; a first pump, located on a first pipe connecting the first and second containers, for directing the solution stored in the first container to the second container; and a first filter, located in the first pipe, for filtering the solution flowing through the first pipe from the first container toward the second container. The system further includes: a second pipe for connecting the first container and the second container; and a second pump, located on the second pipe, for directing the solution stored in the second container to the first container.

Chemical supply system, substrate treatment apparatus incorporating the same, and coating and developing system incorporating the same apparatus

In a process facility for producing semiconductor wafers, a third physical unit is configured between two physical units that produce mini environments. The third physical unit has a laminar flow at right angles to the laminar flows of the two physical units and is operated with a slightly higher flow velocity. According to the Bernoulli equation, the static pressure in the third physical unit is therefore lower than in the surrounding two physical units. Advantageously, therefore, no contamination from the more highly loaded one of the two physical units passes over into the lesser loaded one of the two physical units.

Process facility having at least two physical units each having a reduced density of contaminating particles with respect to the surroundings

Growing community of inventors

Dresden, Germany

Steffen Hornig