Uop Lcc

Symyx Technologies, Inc.

Steffen Hardt

Kurt M Vanden Bussche

Suheil F Abdo

Volker Hessel

Holger Löwe

Shenheng Guan

H Sam Bergh

James R Engstrom

Astrid Lohf

Holger L&ouml;we

Frank Michel

Parallel flow chemical processing systems, such as parallel flow chemical reaction systems are disclosed. These systems are adapted to simultaneously and independently vary temperature between separate flow channels, preferably by employing separate, individual heating elements in thermal communication with each of four or more parallel flow reactors. The flow reactors are preferably isolated from each other using a thermal isolation system comprising fluid-based heat exchange. In preferred embodiments, the axial heat flux can be fixedly or controllably varied.

Parallel flow reactor having improved thermal control

A novel mixing apparatus and process for mixing at least two fluids are disclosed. Excellent mixing and superior pressure drop characteristics are achieved in a device comprising at least two supply channels to feed a mixing chamber and create a vortex. The alignment of the supply channels is such that fluids are introduced into the chamber at both tangential and radial directions. In the case of gas/liquid mixing, particularly advantageous is the injection of the liquid stream tangentially and the gas stream radially. When two liquid streams are mixed, it is desirable to distribute them into fine, interdigitated channels prior to introduction into a supply channel and finally into the chamber. The mixed stream is generally withdrawn from the center of the swirling vortex and in a direction perpendicular to the plane of the vortex.

Static mixer and process for mixing at least two fluids

A novel apparatus for mixing and reacting at least two fluids are disclosed. Excellent mixing and superior pressure drop characteristics are achieved in a device comprising at least two supply channels to feed a mixing chamber and create a vortex. The alignment of the supply channels is such that fluids are introduced into the chamber at both tangential and radial directions. In the case of gas/liquid mixing, particularly advantageous is the injection of the liquid stream tangentially and the gas stream radially. Reaction of the fluids can take place within the mixing chamber or in a separate reactor in fluid communication with the mixing chamber outlet. The mixer/reactor apparatus is especially useful for reactions where rapid diffusion is critical.

Apparatus for mixing and reacting at least two fluids

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Mainz, Germany

Steffen Hardt