University of California

Abeam Technologies, Inc.

Stefano Cabrini

Eli Yablonovitch

Christophe Peroz

Hyuck Choo

Hoi-Ying N Holman

P James Schuck

Xiaogan Liang

Peter J Schuck

Arthur Okhtay Montazeri

Alexander Weber-Bargioni

Wei Bao

Irene Fernandez-Cuesta

Mauro Melli

Carlos Pina Hernandez

Plasmonic gratings, along with methods of creating devices using width-graded plasmonic gratings are described. Plasmonic gratings may be transmission-type or closed-ended plasmonic gratings, and may be disposed on detectors to enhance the spectral range detection of the detectors or in further device architectures.

Plasmonic ultrasensitive multiplex analysis platform for hyperspectral molecular sensing

This disclosure provides systems, methods, and apparatus related to optofluidic devices. In one aspect, an optofluidic device includes a substrate, a first nanostructure, a second nanostructure, and a cover. A channel having cross-sectional dimensions of less than about 100 nanometers is defined in a surface of the substrate. The first nanostructure is disposed on the substrate on a first side of the channel and proximate the channel. The second nanostructure is disposed on the substrate on a second side of the channel and proximate the channel. The first and the second nanostructures are disposed on a line that passes across the channel. The cover is disposed on the surface of the substrate.

Optofluidic devices and methods for sensing single particles

Provided is a composition for resist patterning comprising a thiol; at least one -ene monomer; at least one polymerization initiator; and, optionally, a metal oxide used in an amount of 0.1 to 50 wt. % per weight of the composition; the thiol and -ene monomer are used in a stoichiometric ratio with a refractive index between 1.6 and 1.8. The composition is used in a patterning process wherein the composition is dispensed to the substrate, is covered with a mask, and is cured, e.g., by UV radiation, at room temperature with light having a wavelength in the range of 200 nm to 450 nm. The process may be carried out with thermal annealing.

Composition for resist patterning and method of manufacturing optical structures using imprint lithography

The present invention provides a plasmonic optical transformer to produce a highly focuses optical beam spot, where the transformer includes a first metal layer, a dielectric layer formed on the first metal layer, and a second metal layer formed on the dielectric layer, where the first metal layer, the dielectric layer, and the second layer are patterned to a shape including a first section having a first cross section, a second section following the first section having a cross-section tapering from the first section to a smaller cross-section, and a third section following the second section having a cross-section matching the tapered smaller cross-section of the second section.

Nano-fabricated plasmonic optical transformer

This disclosure provides systems, methods, and apparatus related to probes for multidimensional nanospectroscopic imaging. In one aspect, a method includes providing a transparent tip comprising a dielectric material. A four-sided pyramidal-shaped structure is formed at an apex of the transparent tip using a focused ion beam. Metal layers are deposited over two opposing sides of the four-sided pyramidal-shaped structure.

Probes for multidimensional nanospectroscopic imaging and methods of fabrication thereof

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Albany, CA, United States of America

Stefano Cabrini