Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Carl-zeiss-stiftung

Stefan Xalter

Yim-Bun Patrick Kwan

Bernhard Gellrich

Damian Fiolka

Markus Deguenther

Johannes Wangler

Michael Patra

Manfred Maul

Hubert Holderer

Christian Wagner

Michael Layh

Franz Sorg

Jan Horn

Florian Bach

Wolfgang Hummel

Johannes Eisenmenger

Andras G Major

Jochen Becker

Hermann Bieg

Rudolf Von B&uuml;nau

Uy-Liem Nguyen

Jens Kugler

Frank Melzer

Michael Muehlbeyer

Ulrich Weber

Bernhard Geuppert

Ulrich Loering

Stefan Hembacher

Thomas Bischoff

Karl-Eugen Aubele

Peter Deufel

Marcus Will

Werner M&uuml;ller-Rissmann

Martin Schmidt

Saverio Sanvido

Karl-Heinz Schuster

Aksel Goehnermeier

Armin Schoeppach

Guido Limbach

Dirk Hellweg

Thomas Ittner

Viktor Kulitzki

Peter Meyer

Toralf Gruner

Johannes Lippert

Andreas Wurmbrand

Jens Prochnau

Yim Bun Patrick Kwan

Willi Heintel

Ralf Zweering

Andreas Frommeyer

Yim-Bun-Patrick Kwan

Harald Kirchner

Daniel Golde

Michael Mühlbeyer

Markus Degünther

Herman Soemers

Benjahman Julius Modeste

Bernard Stommen

Wolfgang Keller

András G Major

Karsten Siegmanski

Franz Van Deuren

Paul Peter Anne Brom

Hans-Jürgen Scherle

Mark Feygin

Fraser G Morrison

Yim-Bum Patrick Kwan

Aksel Göhnermeier

Viktor Kulitsky

Yin-Bun Patrick Kwan

A stop, such as a numerical aperture stop, obscuration stop or false-light stop, for a lithography apparatus, includes a light-transmissive aperture and a stop element, in which or at which the aperture is provided. The stop element is opaque and fluid-permeable outside the aperture.

Stop, optical system and lithography apparatus

A projection exposure apparatus for semiconductor lithography having a projection optical unit. The projection optical unit includes a sensor frame, a carrying frame, and a module. The module includes an optical element and actuators for positioning and orienting the optical element. The module is on the carrying frame, and the sensor frame is a reference for the positioning of the optical element. The module includes an infrastructure which includes interfaces for separating a module from the projection optical unit. A method exchanges the module of a projection optical unit of a projection exposure apparatus for semiconductor lithography, wherein the module includes an optical element, while the reference remains in the projection exposure apparatus.

Projection exposure apparatus for semiconductor lithography

A connection arrangement is provided for a force-fit connecting ceramic components for a lithography apparatus. The connection arrangement includes first and a second ceramic components and a clamping device. The clamping device directly clamps the first and the second ceramic component against one another in a force-fit manner.

Connection arrangement for a force-fit connection between ceramic components

The invention relates to an optical imaging device, in particular an objectivefor microlithography in the field of EUVL for producing semiconductor components, having a beam path, a plurality of optical elementsand a diaphragm devicewith an adjustable diaphragm opening shape. The diaphragm device has a diaphragm storewith a plurality of different diaphragm openingswith fixed shapes in each case, which can be introduced into the beam path

Diaphragm changing device

Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

An optical imaging apparatus includes an optical element support sub-structure and an auxiliary support sub-structure. The optical element support sub-structure is configured to support an optical element and has a first temporary support interface arrangement. The optical element is configured to form part of a group of optical elements of the optical imaging apparatus configured to transfer, in an exposure process using exposure light, an image of a pattern of a mask onto a substrate. The auxiliary support sub-structure is configured to support an auxiliary component and has a second temporary support interface arrangement. The auxiliary component is configured to execute, during the exposure process, an auxiliary function of the exposure process other than transferring the image of the pattern onto the substrate.

Optical imaging arrangement with simplified manufacture

An optical system for semiconductor lithography including a plurality of optical components, as well as related components and methods, are disclosed. The apparatus can include an optical component that can be moved by a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0&#xb0; and 90&#xb0;, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%.

Optical system for semiconductor lithography

An optical arrangement has a plurality of optical elements capable of transmitting a beam. A partial housing is provided which extends from a surface of an optical element in the direction of the beam emanating from the optical element, or of the beam incident on the optical element, and whose shape is adapted to the shape of the beam. The partial housing is surrounded at least partially by a measurement structure which is mechanically decoupled therefrom. The measurement structure has at least one sensor.

Low-contamination optical arrangement

An optical arrangement includes a multiplicity of optical elements and a carrier structure which carries the optical elements. The carrier structure is composed of at least two releasably interconnected modules. Each module is composed of at least one carrier structure subelement. A subhousing is produced by a multiplicity of carrier structure subelements and/or modules. The subhousing has a geometry that varies, at least in regions, in correspondence to a usable beam path in the projection exposure apparatus, the usable beam path being defined as an envelope of all light bundles which can propagate from all field points in a field plane to an image plane of the projection exposure apparatus. A projection exposure apparatus for EUV lithography includes such an optical arrangement.

Optical arrangement in a projection exposure apparatus for EUV lithography

The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.

Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations

An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.

Optical assembly

Growing community of inventors

Oberkochen, Germany

Stefan Xalter