Schunk Kohlenstofftechnik Gmbh

Hoffmann & Co Elektrokohle Ag

Schunk Kohlensteofftechnik Gmbh

Stefan Schneweis

Klaus Reiser

Roland Weiss

Martin Henrich

Thorsten Scheibel

Marco Ebert

Ralf Gaertner

Conrad Reynvaan

The embodiments of the invention relate to an electrode for electrolysis comprising an electrode substrate and a coating of the electrode substrate with a polycrystalline diamond material, that the electrode substrate consists of a base body of carbon material and at least one contact layer of the electrode substrate carrying the coating consists of a non-metallic, electrically conductive material.

Electrode for electrolysis

A carrier for an object, preferably a substrate of a semiconductor component such as a wafer, includes a receiving element for the object and gas outlets arranged below the receiving element along the object received. At least sections of the carrier are made of a material which including stabilizing fibers and having a porosity which forms the gas outlets, in order to enable a desired gas to exit from the gas outlets in a dosed and finely distributed manner.

Carrier for receiving an object and method for the production of a carrier

A support for structural components that are subjected to a thermal treatment process. The support includes a frame having limbs and extending therefrom a grid of intersecting strands. In order to prevent the support from warping even when subjected to strong thermal loads or variations in temperature, the frame is produced from a temperature-resistant material and the strands are produced from carbon fibers or ceramic fibers that form the grid, extending from the limbs of the frame.

Support for structural components and method for producing the same

A method of regulating a high temperature gas phase process on the basis of a measurement curve determined by means of infrared spectroscopy, the curve having at least one spectral peak which is characteristic for the regulation of the process and which deviates from a background of the measurement curve. A straight line synthetic background is calculated directly from the measurement curve on the basis of initial and end values of the characteristic spectral peak, and the peak is integrated over the straight line, or a maximum height of the peak over the straight line, or another characteristic value of the peak relative to the straight line is utilized. The process is regulated based on measured peak and the synthetic background.

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Grävenwiesbach, Germany

Stefan Schneweis