Carl Zeiss Smt Gmbh

Carl Zeiss Ag

Mirrorcle Technologies, Inc.

Carl Zeiss Meditec Ag

Carl Zeiss Microscopy Gmbh

Mirrocle Technologies Inc.

Stefan Richter

Veljko Milanovic

Johannes Kindt

Philipp Huebner

Enrico Geissler

Gerhard Krampert

Daniel Bublitz

Timo Mappes

Wolfgang Singer

Markus Deguenther

Oliver Schmidt

Guenter Rudolph

Jan Horn

Bernd Spruck

Thomas Mohr

Michel Stutz

Detlef Biernat

Frank Hoeller

Cristina Alvarez Diez

Günter Rudolph

Martin Voelcker

Lars-Christian Wittig

Dirk Doering

Christian Koos

Jorg Petschulat

Andreas Brodschelm

Simon Brattke

Lakshmanan Senthil Kumar

Jörg Petschulat

Philipp HÜBNER

A microelectromechanical system (MEMS) device includes a substrate, a suspended element and a damping structure connected to the suspended element and one or more fluid confinement structures. The suspended element is connected to a fixed part of the substrate by one or more flexures configured to permit movement of the suspended element relative to a fixed part of the substrate. The damping structure extends into a gap between the suspended element and the fixed part of the substrate. The damping structure includes one or more winglets that protrude over a recessed portion of the fixed part of the substrate. The fluid confinement structures are formed by the recessed portion of the fixed substrate and are configured to permit movement of the damping structure over the recessed portion of the substrate and confine a viscoelastic fluid to the limited portion of the gap underneath the winglets.

MEMS device with damping fluid vertically sandwiched between moving and non-moving structures

A microelectromechanical system (MEMS) device comprising a wafer including a MEMS device in a substrate of the wafer is mounted to a fluid dispenser stage. The MEMS device has a damping structure coupled to a suspended element and one or more fluid confinement structures. The suspended element is connected to a fixed part of the substrate by one or more flexures configured to permit movement of the suspended element relative to the fixed part of the substrate. The damping structure extends into a gap between the suspended element and fixed part of the substrate. The fluid confinement structures permit movement of the damping structure within a limited portion of the gap and confine a viscoelastic fluid to the limited portion of the gap. A viscoelastic fluid is deposited onto the wafer in an area of the wafer configured to communicate the viscoelastic fluid into the limited portion of the gap.

Fabrication of MEMS device with automated dispensing of damping fluid and viscosity control

MEMS devices include a suspended element connected to a fixed part of a substrate by one or more flexures, wherein the one or more flexures are configured to permit movement of the suspended element relative to a fixed part of the substrate. A sensor coupled to the suspended element and a damping structure coupled to the suspended element extends into a gap between the suspended element and the fixed part of the substrate. One or more fluid confinement structures are configured to permit movement of the damping structure within a limited portion of the gap and to confine a viscoelastic fluid to the limited portion of the gap.

MEMS device with improved dynamic mechanical performance through damping by localized viscoelastic medium

An electro-optical circuit board can provide probe card functionality. The electro-optical circuit board includes at least one electrical conductor track and at least one optical beam path.

Electro-optical circuit board for contacting photonic integrated circuits

Methods and apparatuses for testing a photonic integrated circuit and a corresponding sample holder and a photonic integrated circuit are provided. Here, a location for an illumination light beam can be selected by way of a scanning device, with the result that targeted coupling of the illumination light into the photonic integrated circuit is made possible.

Devices, methods and sample holder for testing photonic integrated circuits and photonic integrated circuits

MEMS devices include a suspended element connected to a fixed part of a substrate by one or more flexures, wherein the one or more flexures are configured to permit movement of the suspended element relative to a fixed part of the substrate. An actuator coupled to the suspended element and a damping structure coupled to the suspended element extends into a gap between the suspended element and the fixed part of the substrate. One or more fluid confinement structures are configured to permit movement of the damping structure within a limited portion of the gap and to confine a viscoelastic fluid to the limited portion of the gap.

MEMS devices include fluid confinement structures on either a fixed part of a substrate and/or on a suspended element. The fluid confinement structures may be configured to confine a viscoelastic fluid in a limited part of a gap between one or more vertical sidewalls of both the fixed part of the substrate and either the suspended element or the drive beam or both the suspended element and drive beam such that one part of the gap is bridged by the fluid and another part of the gap is not, The structures may be configured to prevent flow of the fluid to other parts of the gap.

MEMS device

An optical arrangement for a lithography apparatus has a microsystem with a mirror array. A respective mirror of the mirror array is set up to reflect working light of the lithography apparatus on its front side and also a measuring beam on its rear side. One or more radiation sources, which are provided outside the microsystem, are set up to provide the respective measuring beam. One or more sensor units are set up to sense a tilting angle of a respective mirror in dependence on the respectively reflected measuring beam.

Optical arrangement and lithography apparatus

The disclosure relates to a lithography apparatus for writing to substrate wafers. The apparatus includes: a light generating device including one or a plurality of light sources for generating light; a writing device; a light transferring device including a number of optical waveguides for transferring the light from the light generating device to a writing device, the writing device including a plurality of individually controllable write heads for projecting the light from the one or the plurality of light sources in different regions of a substrate wafer; a transport device for moving the substrate wafer relative to the writing device in a predefined transport direction; and a control device for controlling the writing process on the substrate wafer.

Lithography apparatus comprising a plurality of individually controllable write heads

An optical system for producing lithographic structures is disclosed. Also disclosed is a method for determining relative coordinates of a position of a writing field relative to a position of a preview field in such an optical system, and a method for producing lithographic structures using such an optical system.

Optical system for producing lithographic structures

A laser scanning microscope (SR-LSM) and a method for correcting imaging errors in a laser scanning microscope. The SR-LSM includes an illumination device for providing an illumination spot; a scanner for moving the illumination spot to consecutive scanning positions over a sample to be examined; an adaptive optics unit for controlling a wavefront of the illumination spot with a control device and a detector for determining a spatially resolved imaging spot emitted by the sample. An evaluation unit is provided for determining a point-spread function (PSF) of the imaging spot at each scanning position, whereby a wavefront correction signal determined from the point-spread function (PSF) of a scanning position is supplied to the control device of the adaptive optics unit or is used in digital post-processing of the microscope image (e.g. by means of deconvolution).

Laser scanning microscope and method for correcting imaging errors particularly in high-resolution scanning microscopy

The invention is directed to an optical scanning device with two scanning mirrors and with optical elements for imaging the two scanning mirrors one onto the other by means of an intermediate image. A control unit is provided for supplying drives which are coupled to the scanning mirrors with excitation voltages or excitation currents to initiate deflection angles ranging from zero to the maximum possible deflection angle for the two scanning mirrors. At least one of the scanning mirrors is designed for biaxial scanning, and the control unit is designed to vary the driving of the two scanning mirrors with respect to biaxial or uniaxial deflection of the beam bundle electively in quasistatic or resonant mode of operation. At least one of the two scanning mirrors is preferably designed as MEMS assembly.

Optical scanning device

In an embodiment a method for position determination of an object in a spatial area is provided in which the object is illuminated with at least one light beam. The light beam does not cover the complete spatial area and is guided into a part of the spatial area in which the object is present depending on the position of the object. In another aspect a method for measuring a surface is provided.

Devices and methods for position determination and surface measurement

In addition to a first detector for capturing a potential movement field of the eye in overview images, a second detector is used to capture a particular section of the eye in sectional images. From a displacement between two overview images and an intermediate displacement between two sectional images taken between said overview images, the eye movement is determined by linking said displacements. The sections are preferably illuminated by coherent light such that interfering light diffused on the eye produces a patch pattern. Alternatively, the sclera of the eye is illuminated with coherent light such that light diffused on the sclera produces a patch pattern, of which a particular part is captured using a spatially resolving detector in sectional images, on the basis of which an intermediate displacement is determined.

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Jena, Germany

Stefan Richter