Universitãt Stuttgart

Trumpf Lasersystems for Semiconductor Manufacturing Gmbh

Asml Netherlands B.v.

Trumpf Lasersystems for Semiconductor Manufacturing Se

Stefan Piehler

Benjamin Dannecker

Derk Jan Wilfred Klunder

Ruud Antonius Catharina Maria Beerens

Martin Lambert

Frank B Sperling

Tolga Ergin

Stefan Michael Bruno Bäumer

Andrey Sergeevich Tychkov

Oliver Schlosser

Jan Philipp Negel

Nico Johannes Antonius Hubertus Boonen

Andreas Kristian Hopf

Jan-Philipp Negel

Manisha Ranjan

Jasper Witte

André Loescher

Jiayue Yuan

A laser focusing system () for use in an EUV radiation source is described, the laser focusing system comprising: •—a first curved mirror () configured to receive a laser beam from a beam delivery system () and generate a first reflected laser beam (); •—a second curved mirror () configured to receive the first reflected laser beam () and generate a second reflected laser beam (), wherein the laser focusing system () is configured to focus the second reflected laser beam () to a target location () in a vessel () of the EUV radiation source ().

Laser focussing module

A EUV light source includes a prepulse laser source for emitting a prepulse laser beam at a prepulse wavelength, a main pulse laser source for emitting a main pulse laser beam at a main pulse wavelength, a prepulse beam guiding device for feeding the prepulse laser beam into a radiation generating chamber for irradiation of a target material with a prepulse, and a main pulse beam guiding device for feeding the main pulse laser beam into the radiation generating chamber for irradiation of the target material with a main pulse. The target material is configured to emit EUV radiation on account of the irradiation with the prepulse and the main pulse. The prepulse beam guiding device has a separation device configured to reflect disturbing radiation in a wavelength range that does not include the prepulse wavelength back into the radiation generating chamber or into at least one beam trap.

EUV light source with a separation device

The present invention relates to an optical module configured to be optically coupleable to a laser amplifier module, the optical module comprising an inner optical element having a plurality of M inner reflective elements arranged around a center of the inner optical element; and a plurality of N outer reflective elements arranged around the inner optical element, the plurality of N outer reflective elements being configured to face the inner optical element, wherein the plurality of M inner reflective elements and the plurality of N outer reflective elements are configured to provide an optical path for a laser beam.

Optical module, laser amplifier system, method and use

The present disclosure provides a method and to a device for quantitatively sensing the power fraction of a radiation background of a pulsed laser. The disclosure further relates to the use of a saturable element. The method includes modulating a measurement beam, which is emitted by the laser, by means of a saturable element in accordance with the fluence of the measurement beam, detecting, by means of a modulation beam power detector, the power of the measurement beam modulated by the saturable element, and determining the power fraction of the radiation background of the pulsed laser on the basis of the detected power of the measurement beam modulated by means of the saturable element.

Method and device for quantitatively sensing the power fraction of a radiation background of a pulsed laser

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Stuttgart, Germany

Stefan Piehler