Asml Netherlands B.v.

Asml Holding N.v.

Asml Holdings N.v.

Stefan Philip Christiaan Belfroid

Nicolaas Rudolf Kemper

Nicolaas Ten Kate

Johannes Petrus Maria Smeulers

Sjoerd Nicolaas Lambertus Donders

Christiaan Alexander Hoogendam

Jeroen Johannes Sophia Maria Mertens

Henrikus Herman Marie Cox

Jan-Gerard Cornelis Van Der Toorn

Frits Van Der Meulen

Franciscus Johannes Herman Maria Teunissen

Herman Vogel

Roelof Frederik De Graaf

Martinus Cornelis Maria Verhagen

Joost Jeroen Ottens

Edwin Augustinus Matheus Van Gompel

Marco Polizzi

Martinus Hendrikus Antonius Leenders

Sergei Shulepov

Marcel Beckers

Arno Willem Frederik Volker

Ferdy Migchelbrink

Rene Breeuwer

Roelof Frederick De Graaf

Martinus Hendrukus Antonius Leenders

Martinus Cornelius Maria Verhagen

A plurality of extraction conduits is provided to remove immersion liquid into a chamber. The extraction conduits are arranged at different distances from a target portion of the substrate. From the chamber, a passage is provided to which a suction force is applied. When all the conduits are filled with immersion liquid, the extraction capacity will be greater than when one or more of the conduits comprise gas.

Lithographic apparatus and device manufacturing method involving a barrier structure to handle liquid

A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

Lithographic apparatus and device manufacturing method

A lithographic projection apparatus, including a liquid supply system configured to supply a liquid to a space between a projection system and a movable table; a member to at least partly confine liquid in the space, the member including a recovery opening facing toward the movable table, the recovery opening including a first porous structure configured to recover fluid; and a chamber configured to receive recovered fluid and to separate liquid from gas in the recovered fluid, the chamber including a second porous structure.

A plurality of extraction conduits are provided to remove immersion liquid into a chamber. The extraction conduits are arranged at different distances from a target portion of the substrate. From the chamber, a passage is provided to which a suction force is applied. When all the conduits are filled with immersion liquid, the extraction capacity will be greater than when one or more of the conduits comprise gas.

In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate.

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Delft, Netherlands

Stefan Philip Christiaan Belfroid