Asml Netherlands B.v.

Stefan Michael Bruno Baumer

Johannes Jacobus Matheus Baselmans

Marcus Adrianus Van De Kerkhof

Jozef Maria Finders

Pieter-Jan Van Zwol

Laurentius Cornelius De Winter

Robbert Jan Voogd

Wouter Joep Engelen

Pieter Cristiaan De Groot

Maksym Yuriiovych Sladkov

Gerard Frans Jozef Schasfoort

Manfred Petrus Johannes Maria Dikkers

A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.

Patterning device

Growing community of inventors

Valkenswaard, Netherlands

Stefan Michael Bruno Baumer