Micronic Laser Systems Ab

Stefan Gullstrand

Leif Odselius

Torbjorn E Sandstrom

Peter Ekberg

Torbj&ouml;rn Sandstr&ouml;m

Mattias Israelsson

Anders Thuren

Ingvar Gustaf Andersson

The present invention relates to a system and a method for microlithographic writing and inspection on photosensitive substrates, and specially printing and inspection of patterns with extremely high precision, such as photomasks for semiconductor device patterns, display panels, integrated optical, devices and electronic interconnect structures. More specifically the invention relates to compensation of substrate offset by modifying the position data or the feeding of the same of the deflector, and the use of a direct digital synthesis (DDS) unit for generation of the sweep frequency drive signal.

Beam positioning in microlithography writing

A system and method are provided for microlithographic writing on photosensitive substrates, and especially high precision printing of patterns, such as photomasks, for semiconductor device patterns, display panels, integrated optical devices and electronic interconnect structures. The method includes the steps of detecting significant temporary writing error conditions and interrupting the writing process as a response to a detection of such an error condition. Thereafter a support table is reversed to the position it had when the writing was interrupted, and the writing process is restarted at the same position where the writing was interrupted when the error condition ceases to exist.

Laser writer

Growing community of inventors

Danderyd, Sweden

Stefan Gullstrand