Oerlikon Trading Ag, Trubbach

Oerlikon Surface Solutions Ag, Pfaffikon

Oerlikon Surface Solutions Ag, Pfaeffikon

Cemecon-ceramic Metal Coatings-dr. Ing. Antonius Leyendecker Gmbh

Cemecon-ceramic Metal Coatings

Oerlikon Surface Solutions Ag, Trubbach

Esser, Stefan

Stefan Esser

Jörg Vetter

Georg Erkens

Joerg Vetter

Antonius Leyendecker

Hans-Gerd Fuss

Rainer Wenke

Martin Zaech

Jürgen Müller

Bernd Hermeler

Jurgen Mueller

Martin Zäch

Ingo Künzel

Juergen Mueller

Zäch Martin

Cylindrical evaporation source which includes, at an outer cylinder wall, target material to be evaporated as well as a first magnetic field source and a second magnetic field source which form at least a part of a magnet system and are arranged in an interior of the cylindrical evaporation source for generating a magnetic field. In this respect, first magnetic field source and second magnetic field source are provided at a carrier system such that a shape and/or a strength of the magnetic field can be set in a predefinable spatial region in accordance with a predefinable scheme. In embodiments, the carrier system is configured for setting the shape and/or strength of the magnetic field of the carrier system such that the first magnetic field source is arranged at a first carrier arm and is pivotable by a predefinable pivot angle (&#x3b1;) with respect to a first pivot axis.

Cylindrical evaporation source

Evaporation source, in particular for use in a sputtering process or in a vacuum arc evaporation process, preferably a cathode vacuum arc evaporation process. The evaporation source includes an inner base body which is arranged in an outer carrier body and which is arranged with respect to the outer carrier body such that a cooling space in flow communication with an inlet and an outlet is formed between the base body and the carrier body. In accordance with the invention, the cooling space includes an inflow space and an outflow space, and the inflow space is in flow communication with the outflow space via an overflow connection for the cooling of the evaporation source such that a cooling fluid can be conveyed from the inlet via the inflow space the overflow connection and the outflow space to the outlet.

Evaporation source

A workpiece carrier has a base frame, a shaft surrounding a drive axis and a workpiece carrier and includes a rotary frame mounted on the base frame so as to be rotatable about the drive axis, workpiece holders mounted on the rotary frame so as to be rotatable about holding axes, a driving part with a holder mounted so as to be rotatable about the drive axis, a transmission part operationally connected to the rotatably mounted workpiece holders, and an intermediate gear attached to the rotatably mounted holder. The intermediate gear is connected to the shaft and to the transmission part in such a way that the transmission part engages with the driving part so as to be rotatable about an output point that is spaced apart from the drive axis by an eccentricity.

Workpiece carrier device

A workpiece carrier () comprises a rotary frame () and a driving part (), both of which are rotatable about a driving axle (). The rotary frame () can be driven by a motor (), and carries a plurality of workpiece holders () which are distributed around the driving axle () so as to be rotatable about holder axes. Mounted in the driving part () on a mount is a pinion () which engages with a stationary central wheel () and a ring gear () of a transmission part (), at the centre of which lies an output point () which is at a distance of an eccentricity from the driving axle (). Driving apertures () on the transmission part (), through which driving pins () of the workpiece holders () project, are also at the distance of the eccentricity from the holder axes. On rotation of the rotary frame (), the driving part () revolves about the driving axle () and additionally imposes on the transmission part (), which rotates concomitantly with the rotary frame (), an eccentric motion such that the output point () circles round the driving axle (), as a result of which corresponding rotation of the workpiece holders () is effected.

A workpiece carrier () comprises a rotary frame () and a driving part (), both of which are rotatable about a driving axle (). The rotary frame () can be driven by a motor (), and carries a plurality of workpiece holders () which are distributed around the driving axle () so as to be rotatable about holder axes. A driving disc () of the driving part () is in each case rotatable about an anchorage point () from which its center point is at a distance of an eccentricity (E). A transmission part () having a coupling cutout which closely receives the driving disc () has driving apertures () through which there project driving pins () of the workpiece holders (), which said driving pins () are likewise at a distance of the eccentricity (E) from the holder axes. The driving part () can be driven at a greater angular velocity by the rotation of the rotary frame (), via an auxiliary gear set () attached to the base frame (). The rotary frames of a plurality of workpiece carriers can be mounted on a base frame which is itself rotatable, and they can be rotated through engagement with a stationary toothed wheel.

The invention relates to a process for producing a hard-material-coated component, comprising the following steps: application of a layer of hard material to the component in a PVD coating unit; and structural further processing of the outer surface of the layer of hard material, and to a component produced using the process. Particularly in the case of thick coatings or coatings with a columnar structure, such processes have a problem producing a sufficiently smooth surface on the coating. The problem is solved by the fact that for the structural further processing, the surface of the layer is blasted in a blasting device in order to improve this surface, an inorganic blasting agent with a grain size in the range from 1 &#x3bc;m to 100 &#x3bc;m and a sharp-edged grain shape being used.

Process for producing a hard-material-coated component

The invention relates to a PVD coating method and to a PVD coating device with a chamber in which at least one target cathode, at least one anode and at least one substrate holder which is intended to hold at least one substrate are arranged, and with a control device which delivers a first voltage in order to supply the target cathode with a negative electrical potential relative to the anode in order to form a plasma in which the substrate is arranged, and which delivers a second voltage in order to supply the anode with a positive electrical potential relative to the chamber wall. In this sputter-coating device, the ion fraction of the target material which can be achieved is too low for qualitatively satisfactory coating properties. It is increased according to the invention in that the control device delivers a third voltage which supplies the substrate with an electrical potential that is more negative than the potential of the anode.

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Aachen, Germany

Stefan Esser