Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.

W. Blosch Ag

Stefan Bruns

René De La Barré

Gerhard Schottner

Michael Vergöhl

Arno Seeboth

Peter Frach

Tobias Zickenrott

Andreas Pflug

Hagen Bartzsch

Daniel Rademacher

Thomas Neubert

Peter Weiss

Detlef Lötzsch

André Kaiser

Thomas Melzig

Matthias Gittner

Christian Rabe

Johanna Fischer

Roland Bartmann

Oliver Werner

Michael VERGÖHL

The invention relates to a method for producing layers with very good uniformity in coating systems with horizontally rotating substrate guiding. Alternatively, certain layer thickness gradients can be set. The particle loading is also significantly reduced. The service life is much higher compared to other methods. Parasitic coatings are reduced. The coating rate is also increased.

Method for producing layers with improved uniformity in coating systems with horizontally rotating substrate guiding

According to the invention, a device is provided for coating substrates having planar or shaped surfaces by means of magnetron sputtering, by means of which device surfaces having any shape, for examples lenses, aspheres or freeform surfaces which have an adjustable layer-thickness profile, can be coated such that a layer function is maintained on the substantially complete surface. A method for coating substrates having planar or shaped surfaces by means of magnetron sputtering is also provided.

Device and method for coating substrates having planar or shaped surfaces by means of magnetron sputtering

The invention relates to a device and a method for producing layers whose layer thickness distribution can be adjusted in coating systems with horizontally rotating substrate. A very homogeneous or a specific non-homogeneous distribution can be adjusted. The particle loading is also significantly reduced. The service life is significantly higher compared to other methods. Forming of parasitic coatings is reduced.

Device and method for producing layers with improved uniformity in coating systems with horizontally rotating substrate and additional plasma sources

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Braunschweig, Germany

Stefan Bruns