Asml Netherlands B.v.

Stef Marten Johan Janssens

Sjoerd Nicolaas Lambertus Donders

Erik Henricus Egidius Catharina Eummelen

Rogier Hendrikus Magdalena Cortie

Siegfried Alexander Tromp

Koen Cuypers

Bert Dirk Scholten

Hendrikus Johannes Schellens

Sudhir Srivastava

Bo Lenssen

Adrianus Marinus Wouter Heeren

Theodorus Johannes Antonius Renckens

Theresa Mary Spaan-Burke

Peter Mark Overschie

Teunis Van Dam

Vadim Yevgenyevich Banine

Marcus Adrianus Van De Kerkhof

Johannes Hubertus Josephina Moors

Andrey Alexandrovich Nikipelov

Jeroen Gerard Gosen

Satish Achanta

A pressure control valve has: a passageway having a flow opening; an member displaceable relative to the opening for obstructing the opening by differing amounts; a piezo actuator; and a linkage mechanism adapted to amplify a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the member relative to the opening, wherein the linkage mechanism comprises a frame attached to a wall and fixed at a first end in relation to the passageway, a portion of the frame moveable in a first direction while being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the movable portion such that an expansion of the piezo actuator results in movement of the movable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the member.

Pressure control valve, a fluid handling structure for lithographic apparatus and a lithographic apparatus

A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system that includes a plurality of gas bearing devices. Each gas bearing device includes: a gas bearing body, which has a free surface, a primary channel which extends through the gas bearing body and has an inlet opening in the free surface, a secondary channel system which extends through the gas bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system is higher than the flow resistance in the primary channel.

Stage system, lithographic apparatus, method for positioning and device manufacturing method

A lithographic apparatus comprising: a clamping surface for supporting a substrate, wherein a property of the clamping surface is defined by at least one clamping surface parameter, and wherein the property of the clamping surface has been selected to exhibit low wear; a clamping apparatus for actuating a clamping operation between the clamping surface and the substrate, wherein the clamping operation is defined at least in part by at least one interface characteristic between the clamping surface and the substrate; and a processing station, operable to apply an adjustment to a first property of the substrate to optimize at least one interface characteristic of a particular clamping operation in dependence on the clamping surface parameter and at least one substrate surface parameter which defines a second property of the substrate.

Lithographic apparatus

A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. The stage system has a plurality of air bearing devices. Each air bearing device has: a gas bearing body which has a free surface, a primary channel which extends through the bearing body and has an inlet opening in the free surface, and a secondary channel system which extends through the bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system can be higher than the flow resistance in the primary channel.

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Eindhoven, Netherlands

Stef Marten Johan Janssens