International Business Machines Corporation

Stanley Joseph Whitehair

David Andrew Lewis

Alfred Viehbeck

Jeffrey Curtis Hedrick

Jerome J Cuomo

Sampath Purushothaman

Charles R Guarnieri

Kevin Shawn Petrarca

Satyanarayana Venkata Nitta

Jane M Shaw

Keith E Fogel

Alfred Grill

Katherine Lynn Saenger

Christopher Vincent Jahnes

Stephen McConnell Gates

Jeffrey Donald Gelorme

Michael Hatzakis

Eva Erika Simonyi

Timothy Joseph Dalton

Gareth Geoffrey Hougham

John Anthony Fitzsimmons

Lawrence Shungwei Mok

James L Speidell

Alphonso Philip Lanzetta

Gary S Selwyn

Maurice McGlashan-Powell

John E Heidenreich, Iii

Stephen Alan Cohen

Hajime Seki

Brian Wayne Herbst

Kurt L Haller

Jeffrey A Hopwood

Bernard Krieger

Bruce A Hoenig

Michael V Grazioso

Martin Yonnone

William V Corso

The present invention related to an improved structure of an optically transparent element that can be used in optical scanners, supermarket scanners, lenses for eyeglasses, etc. The application of oxynitride PECVD films provide good hardness and optical transparency. Such films displaying these physical properties are extremely useful as a scratch resistant coatings in lenses and systems in which an article contacts a transparent surface, such as in scanners and in environments in which intermittent, environmental contact occurs such as in displays for computers and suchlike and in liquid crystal displays, touch displays and compact disks.

Transparent hard coats for optical elements

Novel semiconductor devices containing a discontinuous cap layer and possessing a relatively low dielectric constant are provide herein. The novel semiconductor devices includes at least a substrate, a first dielectric layer applied on at least a portion of the substrate, a first set of openings formed through the dielectric layer to expose the surface of the substrate so that a conductive material deposited within and filling the openings provides a first set of electrical contact conductive elements and a discontinuous layer of cap material covering at least the top of the conductive elements to provide a first set of discontinuous cap elements. Methods for forming the semiconductor devices are also provided.

Semiconductor devices containing a discontinuous cap layer and methods for forming same

A method for forming a multilayer interconnect structure on a substrate that include interconnected conductive wiring and vias spaced apart by a combination of solid or gaseous dielectrics. The inventive method includes the steps of: (a) forming a first planar via plus line level pair embedded in a dielectric matrix formed from one or more solid dielectrics and comprising a via level dielectric and a line level dielectric on a substrate, wherein, at least one of said solid dielectrics is at least partially sacrificial; (b) etching back sacrificial portions of said at least partially sacrificial dielectrics are removed to leave cavities extending into and through said via level, while leaving, at least some of the original via level dielectric as a permanent dielectric under said lines; (c) partially filling or overfilling said cavities with a place-holder material which may or may not be sacrificial; (d) planarizing the structure by removing overfill of said place-holder material; (e) repeating, as necessary, steps (a)-(d); (f) forming a dielectric bridge layer over the planar structure; and (g) forming air gaps by at least partially extracting said place-holder material.

Multilevel interconnect structure containing air gaps and method for making

A metal plus low dielectric constant (low-k) interconnect structure is provided for a semiconductor device wherein adjacent regions in a surface separated by a dielectric have dimensions in width and spacing in the sub 250 nanometer range, and in which reduced lateral leakage current between adjacent metal lines, and a lower effective dielectric constant than a conventional structure, is achieved by the positioning of a differentiating or mask member that is applied for the protection of the dielectric in subsequent processing operations, at a position about 2-5 nanometers below a, to be planarized, surface where there will be a lower electric field. The invention is particularly useful in the damascene type device structure in the art wherein adjacent conductors extend from a substrate through an interlevel dielectric material, connections are made in a trench, a diffusion barrier liner is provided in the interlevel dielectric material and masking is employed to protect the dielectric material between conductors during processing operations.

Semiconductor recessed mask interconnect technology

Method of forming multilevel interconnect structure containing air gaps including utilizing both sacrificial and placeholder material

A means to fabricate a color filter for use in a display, such as a liquid crystal display, in which a physical barrier is created which prevents the flow of a liquid dye after application and ensures that individual cells are filled with only the desired color. Additionally, a means is disclosed which creates a surface with all colors initially present, followed by an exposure means and a development means which enables the desired color to fill the desired cell.

Color filter for TFT displays

A control system for a blind microwave radiation tool a workpiece is described. The controlled system automatically tunes the cavity containing the workpiece. The control system automatically controls the temperature of the workpiece according to a predetermined temperature versus time schedule. Control system automatically determines when the workpiece has reached a particular predetermined physical condition. To achieve these results the control system automatically monitors applied power, reflected power or current temperature and automatically controls the microwave cavity volume and shape and launch structure including antennae location, cavity short location, cavity diameter, coupling loop position, etc. in order to maintain the cavity in resonance and to determine when to exit without operator intervention. Control system can run on a small computer or an embedded controller and is useful for automatically curing polyamic acid to polyimide to a predetermined percent cure, processing preimpregnated glass cloth in a continuous manner which can be used in circuit boards and drying and partial curing of web-like materials automatically without operator intervention.

Radiation control system

A microwave applicator that provides a substantially uniform microwave field distribution over a large area, includes an elongated chamber, preferably operating in the length independent mode. A microwave source generates a microwave field at an output frequency. A waveguide or coaxial cable directs the microwave field from the microwave source into the elongated chamber, either through a side launch, end launch or multi launch. A frequency of the microwave field in the elongated chamber and the output frequency of the microwave source are matched through the use of controlled feedback of critical material and process parameters.

Applicator to provide uniform electric and magnetic fields over a large

A microwave applicator including a cylindrical elongated chamber used to process materials therein; a microwave power source capable of producing microwave power having an electric field; a waveguide connected to the chamber couples microwave power into the microwave chamber. The applicator provides microwave energy having a substantially uniform field distribution over a large area for processing materials such as a web or sheet-like product. The uniformity of the applicator is enhanced by the use of matching devices within the applicator to match the regions of the applicator with no load to regions where the load is present in a continuous manner.

Enhanced uniformity in a length independent microwave applicator

A microwave processing system comprising a microwave applicator and a microwave source. A microwave source generates a microwave field at an output frequency. A frequency of the microwave field in the elongated chamber and the output frequency of the microwave source are matched through the use of controlled feedback of critical material and process parameters.

Feedback system to automatically couple microwave energy into an

The invention is directed to a keyboard where the keys are raised up from a retracted position upon the initialization of usage of the keyboard. An embedded airbag mechanism is self-inflatable to raise keys to the normal operating heights. The keys will be retracted when the airbag is deflated. The rising and retracting of the keys can also be controlled by hinge-like structure. The close and open of the cover of a laptop computer will activate the mechanism to raise and retract the keys on the keyboard.

Keyboards with retractable keys

A microwave applicator includes an elongated chamber, preferably having a cylindrical shape, for processing materials therein. A waveguide, connected to the elongated chamber, couples microwave power into the elongated chamber. The cross-sectional area of the elongated chamber can be mechanically adjusted to control and maintain the microwave field uniformity and resonant mode, preferably the length independent mode TM.sub.010, during the processing of the material. The applicator can thus provide microwave energy having a substantially uniform field distribution over a large area for processing materials in a non-continuous, semi-continuous or fully continuous manner.

Microwave applicator having a mechanical means for tuning

A microwave applicator includes an elongated chamber, preferably having a cylindrical shape, for processing materials therein. A waveguide, connected to the elongated chamber, couples microwave power into the elongated chamber. The cross-sectional area of the elongated chamber can be mechanically adjusted to control and maintain the microwave field uniformity and resonant mode, preferably the length independent mode TM.sub.010, during the processing of the material. The applicator can thus provide microwave energy having a substantially uniform field distribution over a large area for processing materials, for example, a web or sheet like product, plywood and pre-impregnated cloth, in a continuous manner.

Methods are described for fabricating devices having vias containing more than one electrical conductor, in particular coaxial electrical conductors. A plurality of wires are bonded to a first substrate, such as a copper wire to a copper substrate. A second substrate having through-holes with side walls covered with an electrical conductor is disposed over the first substrate so that the wires are within the through-holes and spaced apart from the side walls. The first substrate is spaced apart from the second substrate by dielectric spacers. A polymer is injected into the space between the first and second substrates to provide electrical isolation therebetween. A polymer is injected into the space in the via between the elongated conductors and the conductive sidewall to provide dielectric isolation therebetween. The second substrate has electrically conductive pattern on both sides which are electrically interconnected by the electrically conductive sidewall to form an inner coil of electrical conductors. The first substrate is patterned to form an electrical conductive pattern. A pattern of electrical conductors is formed on the dielectric material on the side of the second substrate opposite the patterned first substrate and is electrically connected therewith through the elongated conductors on the through-hole to form an outer coil of electrical conductors around the inner coil of electrical conductors to from a transformer or an inductor.

Growing community of inventors

Peekskill, NY, United States of America

Stanley Joseph Whitehair