Asml Holding N.v.

Stan Janik

Yuli Vladimirsky

Jason Douglas Hintersteiner

Wenceslao A Cebuhar

A lithography method is provided. The method includes generating a beam of radiation, patterning portions of the beam of radiation, projecting the patterned beam of radiation towards a substrate, and blocking scattered light from the beam of radiation from the substrate.

Systems and methods for minimizing scattered light in multi-SLM maskless lithography

The present invention is directed to a lithography system in which scattered light from a pattern generator, having one or more pattern generating devices, is blocked from an object, such as a wafer or display. The system includes a pattern generator with multiple pattern generating devices, a projection system for directing light from the pattern generating device, and an aperture located at or near an object window. The aperture has a profile that matches the configuration of the pattern generating devices. A method for blocking scattered light in a lithography system using multiple pattern generating devices is also provided.

Growing community of inventors

Naugatuck, CT, United States of America

Stan Janik