Taiwan Semiconductor Manufacturing Comp. Ltd.

Ssutzu Chen

Kei-Wei Chen

Ying-Tsung Chen

Gin-Chen Huang

Ya-Ting Tsai

A cleaning system includes at least one cleaning module configured to receive a substrate after a chemical mechanical polishing (CMP) process and to remove contaminants on the substrate using a cleaning solution. The cleaning system further includes a cleaning solution supply system configured to supply the cleaning solution to the at least one cleaning module. The cleaning solution supply system includes at least one temperature control system. The at least one temperature control system includes a heating device configured to heat the cleaning solution, a cooling device configured to cool the cleaning solution, a temperature sensor configured to monitor a temperature of the cleaning solution, and a temperature controller configured to control the heating device and the cooling device.

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Kaohsiung, Taiwan

Ssutzu Chen