International Business Machines Corporation

Srinvasrao A Shivashankar

Jerome J Cuomo

C Richard Guarnieri

Blasius Brezoczky

Dennis S Yee

David A Smith

Kumbakonam V Ramanathan

A process for forming chromium dioxide thin films which are receptive to high density magnetic recording. The process comprises depositing both chromium and oxygen on a substrate by evaporative techniques and concurrently bombarding the substrate with high energy ions of at least one of the film constituents to form a latent CrO.sub.x film forming layer. The process is carried out at approximately room temperature. The as-grown latent film forming layer is subsequently heat treated by a rapid thermal anneal step which raises the temperature of the as-grown film to about 500.degree. C. The rapid thermal anneal step preferably comprises a series of at least five separte pulses over a 10-second time span. After the rapid thermal anneal, the sample is rapidly quenched to room temperature.

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Mt. Kisco, NY, United States of America

Srinvasrao A Shivashankar