Research Frontiers Inc.

Az Electronic Materials USA Corp.

Caschem, Inc.

Merck Patent Gmbh

Srinivasan Chakrapani

Steven M Slovak

Munirathna Padmanaban

Robert L Saxe

James V Crivello

Takanori Kudo

Shinji Miyazaki

Edward W Ng

M Dalil Rahman

Francis Michael Houlihan

Mark O Neisser

Shigemasa Nakasugi

Kazuma Yamamoto

Alberto D Dioses

Muthiah Thiyagarajan

Yasushi Akiyama

Barry Fanning

Matthew Forlini

David L Rentkiewicz

Ralph R Dammel

The present invention provides a composition for forming a bottom anti-reflective coating, and also provides a photoresist pattern formation method employing that composition. The composition gives a bottom anti-reflective coating used in a lithographic process for manufacturing semiconductor devices, and the coating can be developed with a developing solution for photoresist. The composition contains a solvent, a polymer having a condensed polycyclic aromatic group, and a compound having a maleimide derivative or a maleic anhydride derivative. The composition may further contain a photo acid generator or a crosslinking agent.

Composition for forming a developable bottom antireflective coating

The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces a functionality which aids in the solubility of the polymer in an aqueous alkaline solution and; (ii) at least one photoacid generator; (iii) a crosslinking agent; (iv) optionally, a thermal acid generator; (v) a polymer B which is soluble in an aqueous alkaline solution prior to development, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (vi) a coating solvent composition, and (vii) optionally, a quencher. The invention also relates to a process for imaging the antireflective coating.

Positive-working photoimageable bottom antireflective coating

The present invention relates to an antireflective coating composition comprising a crosslinking agent, a polymer comprising at least one chromophore group and at least one hydroxyl and/or a carboxyl group, and an additive, further where the additive has structure 1 and comprises at least one arylene-hydroxyl moiety, where Y is selected from an carboxylate anion or sulfonate anion, R, R, and Rare independently selected from unsubstituted C-Calkyl, substituted C-Calkyl, aryl and arylene-hydroxyl; X, X, and Xare independently selected from direct valence bond and C-Calkylene group, and, n=1, 2 or 3. The invention further relates to a process for using the composition.

Bottom antireflective coating compositions and processes thereof

Photoresist compositions

An emulsifier for use in forming a film for a suspended particle device (SPD) wherein the film is comprised of a cross-linked matrix polymer having a plurality of droplets of a liquid light valve suspension distributed therein. The emulsifier is formed of a copolymer material comprising at least first and second segments, the segments differing from one another in at least one of their chemical affinities, their compositions and their polarities. A first one of the segments is soluble in an uncured liquid matrix polymer used in forming the film, but insoluble in a liquid suspension medium of which the droplets are dispersed. A second segment is soluble in the liquid suspending medium in the droplets and insoluble in the uncured liquid matrix polymer. The first and second segments have substantially the same index of refraction and the index of refraction of the segments is within 0.010 of that of each phase of an emulsion formed with the emulsifier.

Materials and methods for improving properties of SPD emulsions and films

The present application relates to a compound of formula AiXi where Ai is an organic onium cation; and Xi is an anion of the formula X&#x2014;CFCFOCFCF&#x2014;SO. The compounds are useful as photoactive materials.

Photoactive compounds

The invention is directed to a method for laminating a suspended particle device (SPD) film which comprises forming a suspended particle device film; positioning the suspended particle device film within an unlaminated stack of components for forming a laminated suspended particle device film, wherein the stack comprises at least one hot melt adhesive sheet or film contacting an outer surface of the suspended particle device film; subjecting the unlaminated stack to at least a partial vacuum, preheating the unlaminated stack of components under the vacuum for a time and at a temperature selected to permit at least partial degassing of the stack and applying a sufficient net pressure to the stack at a sufficient temperature and for a sufficient time to produce a laminated suspended particle device film from the unlaminated stack.

Methods for laminating films for SPD light valves and SPD light valves incorporating such laminated films

A film suitable for use as a light-modulating unit of a suspended particle device light valve, comprising a plurality of particles dispersed in a liquid suspending medium, distributed within an optionally crosslinked matrix polymer. The suspending medium is substantially immiscible with the matrix polymer, has a boiling point greater than about 100&#xb0; C., has an electrical resistivity of at least about 0.8&#xd7;10ohms per square, and has an in endex of refraction at 25&#xb0; C. which differs from that of the matrix polymer by no more than about 0.002.

Suspended particle device light valve film

A film suitable for use as a light-modulating unit of a suspended particle device (SPD) light valve. The film comprises a siloxane matrix polymer which has a refractive index&#x3e;1.4630 and has droplets of a liquid light valve suspension distributed within the matrix. The liquid light valve suspension preferably comprises a polyalkyl (meth)acrylate and/or fluorinated (meth)acrylate suspending polymer and optionally may comprise one or more non-polymeric liquids.

Siloxane matrix polymers and SPD light valve films incorporating same

A film suitable for use as the light-modulating unit of an SPD light valve, the film comprising a cross-linked polymer matrix and having droplets of a liquid light valve suspension distributed in the cross-linked polymer matrix, the liquid light valve suspension comprising particles suspended in a liquid suspending medium, wherein the matrix and the droplets each have a refractive index within a range of from about 1.455 to 1.463 and wherein the refractive index of the droplet and the matrix components of the film are preferably matched as closely as possible within RI 0.005 of each other.

SPD films and light valves comprising same

Unsaturated or polyunsaturated, conjugated or nonconjugated hydrocarbons are reacted with an oxidizing agent including hydroperoxides and monopersulfate compounds in the presence of phase-transfer catalysts. Suitable hydrocarbons include ricinic compounds such as castor oil and dehydrated castor oil. The phase-transfer catalysts include novel tungsten peroxo complexes, such as quaternary ammonium tetrakis (diperoxotungsto) phosphates, and crown ethers. Other additives utilized include pH buffers and alkaline compounds including alkali metal and alkaline earth metal carbonates, and solvents.

Epoxidation of ricinic compounds using a phase-transfer catalyst

A film suitable for use as the light-modulating unit of a light valve, is disclosed. The film comprises a cross-linked polymer matrix having droplets of a liquid light valve suspension distributed in the cross-linked polymer matrix. The polymer matrix, prior to cross-linking, comprises a polymer having a Brookfield viscosity of at least 2000 CPs.

SPD films having improved properties and light valves comprising same

Unsaturated or polyunsaturated, conjugated or nonconjugated hydrocarbons are reacted with an oxidizing agent including hydroperoxides and monopersulfate compounds in the presence of phase-transfer catalysts. Suitable hydrocarbons include ricinic compounds such as castor oil and dehydrated castor oil. The phase-transfer catalysts include novel tungsten peroxo complexes, such as quaternary ammonium tetrakis (diperoxotungsto) phosphates, and crown ethers. Other additives opionally utilized include pH buffers, alkaline compounds, and solvents.

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Bridgewater, NJ, United States of America

Srinivasan Chakrapani