Timbre Technologies, Inc.

Vmware, Inc.

Cadence Design Systems, Inc.

Tokyo Electron Limited

Adometry, Inc.

Srinivas Rao Doddi

Junwei Bao

Emmanuel Drege

Nickhil Jakatdar

Vi Vuong

Xinhui Niu

Frank E Gennari

Ya-Chieh Lai

Junjiang Lei

Matthew W Moskewicz

Weiping Fang

Lawrence Lane

Ravi Kumar Devi Reddy

Kuanghao Lay

Mahendra Kumar Kutare

Christophe Briguet

Kannan Parthasarathy

Wen Jin

Hayden Davis

Kelly Barry

Robert Lee Marsa

Shifang Li

Sanjay K Yedur

Taber H Smith

Michael Laughery

Ron Pyke

Mike Laughery

Brian Lee

Jin Wen

Doris Chin

Systems and methods are described for intelligent software patch management. In an example, a system can receive a selection of device attributes. The system can associate a group of computing devices with attribute values that correspond to each device. The system can also create value pairs of unique pairs of values for each computing device. The system can select a set of computing devices for a deployment ring that maximizes diversity of the values or value pairs. The system can deploy the software patch to the selected devices and monitor device performance for a predetermined period of time before continuing to the next deployment ring or rolling back the update.

Intelligent software patch management

Disclosed is a system for detecting security threats in a local network. A security analytics system collects data about entities in the local network. The raw data can be filtered to extract data fields from the raw data that are relevant to detecting security threats in the local network. The filtered data can be converted into structured data that formats the information in the filtered data. The structured data may be formatted based on a set of schema, and can be used to generate a set of features. The security analytics system can use the generated features to build machine-learned models of the behavior of entities in the local network. The security analytics system can use the machine-learned models to generate threat scores representing the likelihood a security threat is present. The security analytics system can provide an indication of the security threat to a user.

Modeling behavior in a network

Disclosed is a system for detecting security threats in a local network. A security analytics system collects data about entities in the local network. The security analytics system parses the raw data into data fields. The security analytics system identifies a subset of the data fields based on the relevance of the data fields to detecting security threats in the local network. The security analytics system generates filtered data containing the subset of data fields and generates structured data based on the filtered data. The security analytics system identifies relationships between the plurality of entities, generates a set of features based on the structured data and the identified relationships, and generates one or more threat scores based on the set of features. The security analytics system detects malicious behavior performed by an entity in the local network based on the generated threat scores.

Security feature extraction for a network

Disclosed is a system for detecting security threats in a local network. A security analytics system collects data about entities in the local network. The security analytics system identifies the entities in the raw data and determines a set of properties about each of the identified entities. The entity properties contain information about the entity and can be temporary or permanent properties about the entity. The security analytics system determines relationships between the identified entities and can be determined based on the entity properties for the identified properties. An entity graph is generated that describes the entity relationships, wherein the nodes of the entity graph represent entities and the edges of the entity graph represent entity relationships. The security analytics system provides a user interface to a user that contains the entity graph and the relationships described therein.

Detecting security threats in a local network

A approach is described for allowing electronic design, verification, and optimization tools to implement very efficient approaches to allow the tools to directly address the effects of manufacturing processes, e.g., to identify and prevent problems caused by lithography processing. Fast models and pattern checking are employed to integrate lithography and manufacturing aware processes within EDA tools such as routers.

Method and system for model-based design and layout of an integrated circuit

Embodiments disclosed herein seamlessly integrate several components into a comprehensive collusion detection and traffic quality prediction system, including a strong modeling module for processing historical click data and transforming potential collusions hidden therein into solvable graph partitioning (network) and/or vector space clustering (pattern) models, a scalable and robust toolkit comprising a plurality of graph partitioning and clustering heuristics for analyzing and generating high density subgraphs and high dimensional clusters or groups, and a post processing module for extracting entities from the subgraphs and clusters and placing them on global block lists. Entities thus listed can be blocked from client networks in real time. As such, high traffic quality can be predicted. A job scheduler may schedule individual jobs from the modeling module based on the number of available resources in a distributed computing environment to minimize completion time while balancing load.

System, method and computer program product for comprehensive collusion detection and network traffic quality prediction

Embodiments disclosed herein provide a practical solution for click fraud detection. One embodiment of a method may comprise constructing representations of entities via a graph network framework. The representations, graphs or vector spaces, may capture information pertaining to clicks by botnets/click farms. To detect click fraud, each representation may be analyzed in the context of clustering, resulting in large data sets with respect to time, frequency, or gap between clicks. Highly accurate and highly scalable heuristics may be developed/applied to identify IP addresses that indicate potential collusion. One embodiment of a system having a computer program product implementing such a click fraud detection method may operate to receive a client file containing clicks gathered at the client side, construct representations of entities utilizing the graph framework described herein, perform clustering on the representations thus constructed, identify IP addresses of interest, and return a list containing same to the client.

System, method and computer program product for collusion detection

Disclosed are a method, a system, and a computer program product for implementing hotspot detection, repair, and optimization of an electronic circuit design, which, in some embodiments, defines, identifies criteria for hotspots/metrics or optimization objective function; performs the initial hotspot or metric prediction; identifies correction candidate(s); applies a correction candidate to the electronic circuit design; and determines whether the outcome of applying the correction candidate is acceptable. The method or the system identifies custom correction candidate(s) or custom command(s) and identifies one or more hints for the predicted hotspots or metrics; provides a single architecture to use a first model for hotspot identification/correction and a second model for design check; and provides the capability to apply a correction for a hotspot or metric, evaluate the effectiveness of the correction on the fly, and revert any changes made to the electronic circuit design by the correction.

Methods, systems, and computer program product for implementing hotspot detection, repair, and optimization of an electronic circuit design

A structure formed on a semiconductor wafer is examined by obtaining a first diffraction signal measured using a metrology device. A second diffraction signal is generated using a machine learning system, where the machine learning system receives as an input one or more parameters that characterize a profile of the structure to generate the second diffraction signal. The first and second diffraction signals are compared. When the first and second diffraction signals match within a matching criterion, a feature of the structure is determined based on the one or more parameters or the profile used by the machine learning system to generate the second diffraction signal.

Optical metrology of structures formed on semiconductor wafers using machine learning systems

A profile model can be selected for use in examining a structure formed on a semiconductor wafer using optical metrology by obtaining an initial profile model having a set of profile parameters. A machine learning system is trained using the initial profile model. A simulated diffraction signal is generated for an optimized profile model using the trained machine learning system, where the optimized profile model has a set of profile parameters with the same or fewer profile parameters than the initial profile model. A determination is made as to whether the one or more termination criteria are met. If the one or more termination criteria are met, the optimized profile model is modified and another simulated diffraction signal is generated using the same trained machine learning system.

Selecting a profile model for use in optical metrology using a machine learning system

A profile model for use in optical metrology of structures in a wafer is selected, the profile model having a set of geometric parameters associated with the dimensions of the structure. The set of geometric parameters is selected to a set of optimization parameters. The number of optimization parameters within the set of optimization parameters is less than the number of geometric parameters within the set of geometric parameters. A set of selected optimization parameters is selected from the set of optimization parameters. The parameters of the set of selected geometric parameters are used as parameters of the selected profile model. The selected profile model is tested against one or more termination criteria.

Model and parameter selection for optical metrology

Specific wavelengths to use in optical metrology of an integrated circuit can be selected using one or more selection criteria and termination criteria. Wavelengths are selected using the selection criteria, and the selection of wavelengths is iterated until the termination criteria are met.

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Fremont, CA, United States of America

Srinivas Rao Doddi