Cadence Design Systems, Inc.

Srini Doddi

Junjiang Lei

Weiping Fang

Kuang-Hao Lay

Nickhil Jakatdar

Li J Song

Emmanuel Drego

A method, system, and computer program product for preprocessing a pattern in a library of patterns and querying a preprocessed library of patterns are disclosed. Embodiments for querying a preprocessed library of patterns are disclosed for determining a distance between the representation for the first pattern and the representation for the second pattern, determining whether the distance between the representation for the first pattern and the representation for the second pattern is within the range for the first pattern, and transforming the second pattern with the transformation matrix to provide information about the second pattern. Embodiments for preprocessing a pattern in a library of patterns are disclosed for determining a transformation matrix for the first pattern, determining a range for the first pattern, wherein a distance between a representation for a first pattern and a representation for a second pattern is within the range and the second pattern can be transformed with the transformation matrix to provide information about the second pattern, and associating the range and the transformation matrix with the first pattern.

Interpolation of irregular data in a finite-dimensional metric space in lithographic simulation

A method, system, and computer program product are disclosed for generating a pattern signature to represent a pattern in an integrated circuit design. In one approach, the method, system and computer program product transform pattern data, two dimensional data for the pattern, into a set of one dimensional mathematical functions, compress the set of one dimensional mathematical functions into a single variable function, compress the single variable function by calculating a set of values for the single variable function, and generate a pattern signature for the pattern from the set of values.

Pattern signature

The present invention is directed to an improved method, system, and computer program product for accessing and analyzing patterns in the integrated circuit design. The method, system or computer program product includes generating an intelligent signature for a pattern. The derived pattern signature is an intelligent pattern identifier because it retains only essential information about a pattern that corresponds to lithography printable portions of the pattern. Accordingly, one pattern signature can represent a group of design patterns that are equivalents from a lithography perspective.

Intelligent pattern signature based on lithography effects

Disclosed are a method, a system, and a computer program product for implementing compact manufacturing model during various stages of electronic circuit designs. In some embodiments, the method or the system receives or identifies physics based data. In some embodiments, the method or the system receives or identifies the physics based data for the corresponding manufacturing process by using the golden manufacturing process model. In some embodiments, the method or the system uses the physics based data to fine tune, modify, or adjust the golden manufacturing process model. In some embodiments, the method or the system invokes the just-right module. In some embodiments, the method or the system implements the compact manufacturing model and the correct-by-design module and provides guidelines for the various stages of the electronic circuit design.

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Fremont, CA, United States of America

Srini Doddi