Lawrence Livermore National Security, LLC

Other

Massachusetts Institute of Technology

University of Texas System

Sorurabh Kumar Saha

Sourabh Kumar Saha

Martin L Culpepper

Robert Matthew Panas

Shih-Chi Chen

James S Oakdale

Michael Cullinan

Ian Seth Ladner

Yina Chang

The present disclosure relates to a method for performing an additive manufacturing operation to form a structure by processing a photopolymer resist material. A laser beam is directed at a tunable mask. At least one emergent beam is collected from a plurality of emergent beams emerging from the tunable mask. The at least one emergent beam is collimated to create a collimated beam. Each emergent beam from the tunable mask has a plurality of beam lets of varying or identical intensity, and each beam let emerges from a unique subsection or region of the tunable mask. The collimated beam is focused into a laser beam which is projected as an image plane onto or within the photopolymer resist material, such that the same optical path length is created between the tunable mask and the focused image plane for all optical frequencies of the focused laser beam. The focused laser beam illuminates a select pattern of subsections on the tunable mask for a finite duration of time to cause simultaneous polymerization of select portions of the photopolymer resist material corresponding to the select pattern.

System and method for submicron additive manufacturing

A scaffold of an electrolyte is fabricated in polymer material using 3D printing techniques. A thin layer of solid electrolyte is deposited on the scaffold followed by burning off the polymer. This leaves behind a 3D foam-like solid electrolyte with two distinct non-overlapping volumes. Lithium followed by a conductive layer (for anode) is then deposited through one volume on the first surface whereas a porous or non-porous conductive layer is deposited on the opposite surface through the second volume. The non-porous conductive layer on the second surface is made porous by a selective timed etch.

Three-dimensional rechargeable battery with solid-state electrolyte

An apparatus is disclosed for performing an additive manufacturing operation to form a structure by processing a photopolymer resist material. The apparatus may incorporate a laser for generating a laser beam, and a tunable mask for receiving the laser beam which has an optically dispersive element. The mask splits the laser beam into a plurality of emergent beams each having a subplurality of beamlets of varying or identical intensity, with each beamlet emerging from a unique subsection of illuminated regions of the mask. A collimator collimates at least one of the emergent beams to form a collimated beam. One or more focusing elements focuses the collimated beam into a focused beam which is projected as a focused image plane on or within the resist material. The focused beam simultaneously illuminates a layer of the resist material to process an entire layer in a parallel fashion.

System and method for sub micron additive manufacturing

A laser-based manufacturing system is disclosed for fabricating non-planar three-dimensional layers. The system may have a laser for producing a laser beam with a plurality of optical wavelengths. An optically dispersive element may be used for receiving the laser beam and splitting the beam into a plurality of distinct beam components, wherein each beam component has spatially separated optical spectral components. A phase mask may be used which is configured to receive at least one of the beam components emerging from the dispersive element and to create a modified beam. One or more focusing elements may then be used to receive the modified beam emerging from the phase mask and to focus the modified beam into a non-planar light sheet for use in fabricating a part.

System and method for curved light sheet projection during two-photon polymerization

According to one embodiment, a method includes contacting a triiodobenzoic acid with an oxalyl chloride in a solvent whereby triiodobenzoyl chloride is formed, contacting diethanolamine with triiodobenzoyl chloride where triiodobenzoic diol amine is formed, and forming an acrylate of triiodobenzoic diol amine with acryloyl chloride where an organoiodine compound is formed. According to another embodiment, an optically clear photopolymer resist blend for additive manufacturing includes a radiopaque pre-polymer compound where the compound includes at least one of the following: iodine, bromine, tin, lead, or bismuth. The resist blend also includes a photoinitiator, a polymerization inhibitor, and a base pre-polymer.

Optically clear photo-polymerization resists for additive manufacturing of radiopaque parts

This invention relates to a microelectromechanical device for mechanical characterization of a specimen. In one embodiment the device may incorporate a substrate, at least one first flexure bearing and at least one second flexure bearing, both being supported on the substrate. First and second movable shuttles may be used which are supported above the substrate by the flexure bearings so that each is free to move linearly relative to the substrate. Ends of the movable shuttles are separated by a gap. A thermal actuator may be connected to one end of the first movable shuttle, and operates to cause the first movable shuttle to move in a direction parallel to the surface of the substrate in response to a signal applied to the thermal actuator. A first capacitive sensor may be formed between the first movable shuttle and the substrate, and a second capacitive sensor formed between the second movable shuttle and the substrate.

Microscale sensors for direct metrology of additively manufactured features

The range of stretch-tunability of sinusoidal wrinkled surfaces that are obtained by compression of supported thin films is limited by the emergence of a period-doubled mode at high compressive strains. This disclosure presents a method to suppress the emergence of the period-doubled mode at high strains. This is achieved by compressing pre-patterned supported thin films, wherein the pre-patterns are substantially similar to the natural pattern of the supported thin film system. As compared to flat thin film systems, pre-patterned thin film systems exhibit period doubling behavior at a higher compressive strain. The onset strain for emergence of period-doubling is tuned by altering the amplitude of the pre-patterns.

Method to suppress period doubling during manufacture of micro and nano scale wrinkled structures

This invention relates to the low-cost manufacture of a tunable physical topographic pattern and more particularly to the manufacture of micro and nano scale hierarchical periodic wrinkle patterns that are generated upon compression of supported thin films. Disclosed herein is (i) a composite material with tunable hierarchical wrinkle patterns, wherein the composite material comprises a stretched and pre-patterned base layer and a thin film that is conformally attached to the pre-patterned surface of the base layer, (ii) a method of fabricating the pre-patterned base via pattern replication, and (iii) a method of fabricating tunable hierarchical wrinkle patterns, wherein the pattern can be deterministically switched across the hierarchical and non-hierarchical states via strain control.

Wrinkled surfaces with tunable hierarchy and methods for the preparation thereof

Wrinkling of supported thin films is a strain-driven phenomenon that enables scalable and low-cost fabrication of periodic micro and nano scale structures. The morphology of wrinkles depends on both the magnitude and the nature of compressive strains that are applied to the thin film. This disclosure presents the methods to fabricate asymmetric 2-D wrinkled structures using biaxial compressive strains. The method relies on the dependence of wrinkle morphology on both strains and strain paths to generate asymmetric 2D wrinkles. Asymmetry is achieved by deliberately traversing the system through a strain state that creates cracks along a preferential direction. Fabricated patterns include non-uniform zigzag wrinkles that demonstrate period doubling only along one direction.

Method to fabricate asymmetric wrinkles using biaxial strains

The pattern complexity and functional value of wrinkled structures can be substantially increased by fabricating the wrinkles on pre-patterned quasi-planar substrates instead of flat substrates. This disclosure presents the methods for fabricating pre-patterned polymeric surfaces that can be subsequently used as the substrates during manufacture of complex wrinkled structures. Pre-patterned substrates are generated by imprinting the pre-patterns onto the substrates during the curing process. Suitability for post-curing use in fabrication of wrinkles is ensured by (i) delayed imprinting that occurs close to but before the gelation point and (ii) gradual alignment of pre-patterns to the direction of stretch that is applied later during manufacture of wrinkled structures.

Method to fabricate pre-patterned surfaces during manufacture of complex wrinkled structures

Wrinkling of thin films is a strain-driven process that enables scalable and low-cost fabrication of periodic micro and nano scale patterns. However, real-world application is limited by the inability of current tools to provide the means for applying large, accurate, and non-equal biaxial strains via a device that can fit within the vacuum chambers that are required for thin film deposition/growth during wrinkling. The present biaxial tensile stage is a compact system that enables one to apply large and accurate non-equal biaxial strains to elastomeric films. It consists of (i) fixtures to clamp and hold films onto the stage, (ii) linear bearings for motion guidance, (iii) integrated actuators for real-time stretch control, (iv) base with kinematic coupling for registration to a metrology system, and (v) the structural frame.

Biaxial tensile stage for fabricating and tuning wrinkles

Passive stamp alignment system. The system includes a stamp supported by a stamp holder resting on three balls affixed to a top platform. A bottom platform supports a substrate to be aligned with the stamp. Means are provided for moving either the top or the bottom platform and holding the other platform stationary so as to contact the substrate with the stamp whereby the stamp holder is lifted away from each of the balls in sequence resulting in alignment of the stamp and the substrate parallel to each other.

Growing community of inventors

Atlanta, GA, United States of America

Sourabh Kumar Saha