Hitachi, Ltd.

Hitachi-high-technologies Corporation

Hitachi High-tech Corporation

Renesas Technology Corp.

Souichi Katagiri

Kan Yasui

Takashi Ohshima

Yoshio Kawamura

Keigo Kasuya

Ui Yamaguchi

Takashi Doi

Soichiro Matsunaga

Hajime Kawano

Masahiko Sato

Masayuki Nagasawa

Hideo Todokoro

Mitsugu Sato

Yasunari Sohda

Shigeo Moriyama

Sadayuki Nishimura

Ryousei Kawai

Masahiko Ogino

Toshihide Agemura

Shigeru Kokubo

Yutaka Kaneko

Yoshinori Nakayama

Minoru Yamazaki

Makoto Ezumi

Takeshi Kawasaki

Hiroya Ohta

Akihiro Miyauchi

Kunio Harada

Takashi Ando

Sukehiro Ito

Seiichi Kondo

Makoto Sakakibara

Kenji Tanimoto

Susumu Komoriya

Sho Takami

Chiseki Haginoya

Takashi Furukawa

Koichiro Takeuchi

Yuji Kasai

Masashi Kimura

Shuhei Ishikawa

Satoshi Osabe

Aki Takei

Erina Kawamoto

Tetsuya Sawahata

The invention provides an electron beam apparatus that reduces a time required for an electron gun chamber to which a sputter ion pump and a non-evaporable getter pump are connected to reach an extreme high vacuum state. The electron beam apparatus includes an electron gun configured to emit an electron beam and the electron gun chamber to which the sputter ion pump and the non-evaporable getter pump are connected. The electron beam apparatus further includes a gas supply unit configured to supply at least one of hydrogen, oxygen, carbon monoxide, and carbon dioxide to the electron gun chamber.

Electron beam apparatus and method for controlling electron beam apparatus

To stabilize an emitted electron beam, a thermoelectric field emission electron source includes: an electron source having a needle shape; a metal wire to which the electron source is fixed and configured to heat the electron source; a stem fixed to an insulator and configured to energize the metal wire; a first electrode having a first opening portion and arranged such that a tip of the electron source protrudes from the first opening portion; a second electrode having a second opening portion; and an insulating body configured to position the first electrode and the second electrode such that a central axis of the first opening portion and a central axis of the second opening portion coincide with each other, and to provide electrical insulation between the first and second electrodes, so as to provide a structure that reduces an amount of gas released when the first electrode is heated.

Thermoelectric field emission electron source and electron beam application device

In order to provide an electron gun capable of maintaining a small spot diameter of a beam converged on a sample even when a probe current applied to the sample is increased, a magnetic field generation sourceis provided with respect to an electron gun including: an electron source; an extraction electrodeconfigured to extract electrons from the electron source; an acceleration electrodeconfigured to accelerate the electrons extracted from the electron source; and a first coiland a first magnetic pathhaving an opening on an electron source side, the first coiland the first magnetic pathforming a control lens configured to converge an electron beam emitted from the acceleration electrode. The magnetic field generation source is provided for canceling a magnetic field, at an installation position of the electron source, generated by the first coiland the first magnetic path

Electron gun and electron beam application device

An object of the invention is to stably supply an electron beam from an electron gun, that is, to prevent variation in intensity of the electron beam. The invention provides a charged particle beam device that includes an electron gun having an electron source, an extraction electrode to which a voltage used for extracting electrons from the electron source is applied, and an acceleration electrode to which a voltage used for accelerating the electrons extracted from the electron source is applied, a first heating unit that heats the extraction electrode, and a second heating unit that heats the acceleration electrode.

Charged particle beam device

In a vacuum apparatus including an ultrahigh vacuum evacuation pump, the ultrahigh vacuum evacuation pump is provided with a rod-shaped cathode including a non-evaporable getter alloy, a cylindrical anode disposed so as to surround the cathode, and a coil or a ring-shaped permanent magnet disposed so as to sandwich upper and lower openings of the cylindrical anode and surround the rod-shaped cathode. As a result, it is possible to reduce the size and weight of the ultrahigh vacuum evacuation pump and to dispose the vacuum evacuation pump at a desired location in the vacuum apparatus.

Vacuum apparatus

An ion pump and a charged particle beam device each includes two opposite flat-plate cathodes, an anode with a cylindrical shape having openings that face the respective flat-plate cathodes, a voltage application unit configured to apply a potential higher than potentials of the flat-plate cathodes to the anode, a magnetic field application unit configured to apply a magnetic field along an axial direction of the cylindrical shape of the anode, and a cathode bar arranged within the anode. The surface of the cathode bar is formed with a material that forms a non-evaporative getter alloy film on the anode or the flat-plate cathodes.

Ion pump and charged particle beam device using the same

An embodiment is to provide a technique that continuously applies a certain amount of an electron beam to a sample by selecting a beam applied to the sample from an electron beam emitted from an electron source in a scanning electron microscope. A charged particle apparatus is configured, including: a mechanism that detects the distribution of electric current strength with respect to the emitting direction of an electron beam emitted from an electron source; a functionality that predicts a fluctuation of an electric current applied to a sample by predicting the distribution of the electric current based on the detected result; a functionality that determines a position at which a beam applied to the sample is acquired based on the predicted result; and a mechanism that controls a position at which a probe beam is acquired based on the determined result.

Charged particle beam apparatus

Increasing the volume or weight of zirconia which is a diffusion and supply source, to extend the life of a field-emission type electron source causes a problem that the diffusion and supply source itself or a tungsten needle is easily subjected to damage. As another problem, although it is considered to form the diffusion and supply source using a thin film to avoid the above-described problem, it is difficult to stably obtain practical life exceeding 8,000 hours. It has been found that practical life exceeding 8,000 hours is stably obtained by providing a field-emission type electron source that has no chips or cracks in a diffusion and supply source and that can extend life with a little bit of an increase in the amount of the diffusion and supply source.

Electric field discharge-type electron source

A charged particle beam apparatus includes a field emission electron source, electrodes for applying an electric field to the field emission electron source, and a vacuum exhaust unit for keeping the pressure around the field emission electron source at 1&#xd7;10Pa or less. The apparatus uses electron beams emitted to have an electron-beam-center radiation angle of 1&#xd7;10sr or less, and uses the electric current thereof, the second order differentiation of which is negative or zero with respect to time, and which reduces at a rate of 10% or less per hour. A heating unit is provided for the field emission electron source, and a detection unit is provided for the electric current of the electron beam. The field emission electron source is repeatedly heated to keep the electric current of the electron beam to be emitted, at a predetermined value or higher.

Charged particle beam apparatus, and method of controlling the same

The present invention provides a charged particle beam apparatus that keeps the degree of vacuum in the vicinity of the electron source to ultra-high vacuum such as 10to 10Pa even in the state where electron beams are emitted using a non-evaporable getter pump and is not affected by dropout foreign particles. The present invention includes a vacuum vessel in which a charged particle source (electron source, ion source, etc.) is disposed and a non-evaporable getter pump disposed at a position that does not directly face electron beams and includes a structure that makes the non-evaporable getter pump upward with respect to a horizontal direction to drop out foreign particles into a bottom in a groove, so that the foreign particles dropped out from the non-evaporable getter pump do not face an electron optical system. Or, the present invention includes a structure that is covered by a shield means, or a means that is disposed immediately on a surface of the non-evaporable getter pump but at a position where the electron beams are not seen and has a concave structure capable of trapping the dropout foreign particles on a lower portion of the non-evaporable getter pump.

An electron gun that serves to reduce the quantity of electron stimulated desorption and accomplishes vacuum evacuation efficiently with a sufficient degree of vacuum. An electron sourceand an extraction electrodeare provided for emitting an electron beamfrom the electron source. A first vacuum chambercontaining the electron sourceis connected to a second vacuum chambervia an apertureprovided in the extraction electrode. Each vacuum chamber is differentially evacuated with an independent vacuum evacuation means, and the generation of electron stimulated desorption gasis reduced by securing a wide route of vacuum evacuation around the electron sourceand intercepting the procession of back scattered electronsemitted from the area with the electron beamon the extraction electrodeby using a shielding electrodegiven a prescribed potential.

Charged particle radiation device

Provided is a charged particle beam apparatus, which can emit a stable electron beam, having high brightness and a narrow energy width. The charged particle beam apparatus comprises a field emission electron source, electrodes for applying an electric field to the field emission electron source, and a vacuum exhaust unit for keeping the pressure around the field emission electron source at 1 10&#x2212;8 Pa or less. The apparatus is so constituted as to use such one of the electron beams emitted as has an electron-beam-center radiation angle of 1&#xd7;10sr or less, and to use the electric current thereof, the second order differentiation of which is negative or zero with respect to the time, and which reduces at a rate of 10% or less per hour. The charged particle beam apparatus further comprises a heating unit for the field emission electron source, and a detection unit for the electric current of the electron beam. The field emission electron source is repeatedly heated to keep the electric current of the electron beam to be emitted, at a predetermined value or higher.

In a mold in which a pattern is formed of a fine concavo-convex shape, two or more of alignment marks for determining a relative positional relation between a substrate and a mold are formed concentrically. Moreover, a damaged mark is identified from the positional information and shape of the respective marks, and an alignment between the mold and the substrate to which a resin film is applied is carried out excluding the damaged mark.

Pattern forming method and its mold

The present invention provides a charged particle beam system which can perform evacuation on an electron gun chamber or an ion-gun chamber having a non-evaporable getter pump in a short time and can maintain the ultra-high vacuum for a long time, and a technology of evacuation therefor. Provided is a charged particle beam system equipped with a charged particle optics which makes the charged particle beam emitted from a charged particle source incident on a sample and means of evacuation for evacuating the charged particle optics, characterized in that the evaporation means has: a vacuum vessel with a charged particle source disposed in the vessel; a non-evaporable getter pump which connects with the vacuum vessel through a vacuum pipe and evacuates the interior of the vacuum vessel as a subsidiary vacuum pump; a valve interposed in the vacuum pipe connecting between the vacuum vessel and the non-evaporable getter pump; a rough pumping port which is provided closer to the non-evaporable getter pump than the valve and performs rough pumping; an open and shut valve for opening and shutting the rough pumping port; and a main vacuum pump which is provided closer to the vacuum vessel than the valve and evacuates the interior of the vacuum vessel.

Charged particle beam system and method for evacuation of the system

The present invention provides a compact electron lens causing little aberration, and a charged particle beam apparatus such as a scanning electron microscope that is super compact and offers a high resolution. An upper magnetic pole and a sample-side magnetic pole are magnetically coupled to the respective poles of a permanent magnet that is made of a highly strong magnetic material such as a rare-earth cobalt system or a neodymium-iron-boron system, that is axially symmetrical, and that has a hole in the center thereof. An inner gap is created on the side of a center axis. Thus, a magnetic lens is formed axially. Moreover, a semi-stationary magnetic path that shields an outside magnetic field and has the magnetic reluctance thereof regulated is disposed outside. The sample-side magnetic pole and magnetic path defines a region where magnetic reluctance is the highest outside the permanent magnet. A space defined by the permanent magnet, upper magnetic pole, sample-die magnetic pole, and semi-stationary magnetic path is filled with a filling made of a non-magnetic material. Thus, an objective lens is constructed.

Electron lens and charged particle beam apparatus

Growing community of inventors

Kodaira, Japan

Souichi Katagiri