Otsuka Electronics Co., Ltd.

Sota Okamoto

Hiroyuki Sano

Yusuke Yamazaki

Yuki Sasaki

Seon Heum Na

An optical characteristic measuring apparatus includes an optical system, a detector, and an analysis unit. The optical system collects detection light incident from a sample. The detector spectrally disperses the detection light in plural times to generate plural pieces of detection data, the plural pieces of detection data indicating their respective spectra of detection light incident from the sample to the optical system with an optical distance between the sample and the optical system being different from each other. The analysis unit analyzes the spectrum indicated by the detection data to measure a predetermined optical characteristic of the sample. The analysis unit specifies a piece of the detection data to be used for measuring the optical characteristic based on intensity of the detection light in the plural pieces of detection data, and measures the optical characteristic based on the specified piece of the detection data.

Optical characteristic measuring apparatus and optical characteristic measuring method

An optical characteristic measurement apparatus which can be reduced in size and can achieve enhanced versatility is provided. The optical characteristic measurement apparatus includes a first optical element which converts measurement light from a measurement target object to parallel light, a reflective lens which reflects the parallel light from the first optical element to convert the parallel light to convergent light, a light reception portion which receives the convergent light from the reflective lens, and a drive mechanism which varies a position of the first optical element relative to the measurement target object.

Optical characteristic measurement apparatus and optical system

An optical characteristic measuring apparatus includes a light source, a detector and a data processing unit. Data processing unit includes a modeling unit, an analyzing unit and a fitting unit. The plurality of film model equations are solved, and prescribed calculation is performed on the assumption that the optical constants included in the plurality of film model equations is identical. Fitting is performed between a waveform obtained by substituting the obtained film thickness and the obtained optical constants of the film into the film model equations and a waveform of the wavelength distribution characteristic obtained by detector, thereby determining that the optical constants included in the plurality of film model equations is identical and that the film thickness and the optical constants obtained by the analyzing unit are correct values.

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Kyoto, Japan

Sota Okamoto