Samsung Electronics Co., Ltd.

Soon-Hong Ahn

Jung-Hwa Lee

Sang-Pyo Hong

A semiconductor device includes first and second unit circuits. Each first unit circuit has first transistors connected in series, wherein each of the first transistors includes a first gate structure having a pitch. Each second unit circuit has second transistors connected in series, wherein each of the second transistors includes a second gate structure having the pitch. A third transistor and a fourth transistor electrically isolate each of the first and second unit circuits, respectively. An insulation layer covers the first through the fourth transistors. Plugs in the insulation layer are connected to a first gate structure, a second gate structure, a first source region, a first drain region, a second source region or a second drain region. A wiring is connected to the plugs.

Semiconductor device, method of manufacturing the same, sense amplifier and method of forming the same

Provided is a semiconductor memory device using a layout scheme where a bottom conductive layer in a peripheral circuit region, which is simultaneously formed with a self-align contact, is connected to one electrode of a power decoupling capacitor. Predetermined capacitors selected among a plurality of capacitors are connected to each other in parallel by using a conductive layer that is simultaneously formed with the self-align contact in a cell array region. Herein, the conductive layer and the self-align contact may be made of the same material. It is possible to embody the decoupling capacitor of a single stage cell type by connecting the conductive layer to a top interconnection layer. In addition, other embodiments implement the decoupling capacitor in a two-stage cell type by connecting a plurality of decoupling capacitors in series by means of the conductive layer in the peripheral circuit region.

Semiconductor memory device having power decoupling capacitor

A semiconductor device includes first, second, and third wells. The first well is connected to a pad to which an external pin is connected and includes a first-type diffusion region that receives a well bias voltage. The second well is adjacent to the first well, and includes an insulating region and a second-type diffusion region outside the insulating region. The third well is adjacent to the second well and includes a first-type diffusion region that receives a first voltage. The insulating region inside the second well along with the first-type well diffusion region of the first well constitute a bipolar junction transistor that cuts off current flowing from the first well to the third well.

Growing community of inventors

Gyeonggi-do, South Korea

Soon-Hong Ahn