Samsung Electronics Co., Ltd.

Soon-Bum Kim

Se-Young Jeong

Sung-min Sim

Kang-Wook Lee

Young-Hee Song

Young-hee Song

In-young Lee

Se-Yong Oh

Sung-Min Sim

Ung-Kwang Kim

Dong-Hyeon Jang

Nam-Seog Kim

Keum-Hee Ma

Se-yong Oh

Eun-Hye Park

Tae-Eun Kim

Jae-sik Chung

Provided is a semiconductor device having a high-reliability solder joint. The semiconductor device includes a high-temperature solder formed on a conductive pad. A low-temperature solder having a lower melting point than the high-temperature solder is formed on the high-temperature solder. A barrier layer is formed between the high-temperature solder and the low-temperature solder. An Sn content of the high-temperature solder is higher than that of the low-temperature solder.

Semiconductor device having solder joint and method of forming the same

Provided is a method of forming conductors (e.g., metal lines and/or bumps) for semiconductor devices and conductors formed from the same. First and second seed metal layers may be formed. At least one mask may be formed on a portion on which a conductor is to be formed. An exposed portion may be oxidized. The oxidized portion may be removed. A conductive structure may be formed on an upper surface of a portion which is not oxidized. The conductors may be metal lines and/or bumps. The conductive structures may be solder balls.

Method of forming metal lines and bumps for semiconductor devices

An interconnection structure includes an integrated circuit (IC) chip having internal circuitry and a terminal to electrically connect the internal circuitry to an external circuit, a passivation layer disposed on a top surface of the IC chip, the passivation layer configured to protect the internal circuitry and to expose the terminal, an input/output (I/O) pad, where the I/O pad includes a first portion in contact with the terminal and a second portion that extends over the passivation layer, and an electroless plating layer disposed on the I/O pad.

Interconnection structure of integrated circuit chip

A method of fabricating wafer level chip scale packages may involve forming a hole to penetrate through a chip pad of an IC chip. A base metal layer may be formed on a first face of a wafer to cover inner surfaces of the hole. An electrode metal layer may fill the hole and rise over the chip pad. A second face of the wafer may be grinded such that the electrode metal layer in the hole may be exposed through the second face. By electroplating, a plated bump may be formed on the electrode metal layer exposed through the second face. The base metal layer may be selectively removed to isolate adjacent electrode metal layers. The wafer may be sawed along scribe lanes to separate individual packages from the wafer.

Fabrication method of wafer level chip scale packages

Provided is a method of fabricating an ultra thin flip-chip package. In the above method, an under barrier metal film is formed on a bond pad of a semiconductor chip. Three-dimensional structured solder bumps are formed on the under barrier metal film, each of the solder bumps including a bar portion and a ball portion disposed at an end of the bar portion. The semiconductor chip including the three-dimensional structured solder bumps is bonded to a solder layer on a printed circuit board to complete a flip-chip package. According to the present invention, by employing the three-dimensional structured solder bumps, it is possible to lower the height of the solder bumps, thereby improving the reliability of an ultra thin flip-chip package.

Method of fabricating ultra thin flip-chip package

Provided is a method for manufacturing WLCSP devices that includes preparing at least two wafers, each wafer having a plurality of corresponding semiconductor chips, each semiconductor chip having through electrodes formed in the peripheral surface region, forming or applying a solid adhesive region to a central surface region, stacking a plurality of wafers and attaching corresponding chips provided on adjacent wafers with the solid adhesive region and connecting corresponding through electrodes of adjacent semiconductor chips, dividing the stacked wafers into individual chip stack packages, and injecting a liquid adhesive into a space remaining between adjacent semiconductor chips incorporated in the resulting chip stack package. By reducing the likelihood of void regions between adjacent semiconductor chips, it is expected that a method according to the exemplary embodiments of the present invention exhibit improved mechanical stability and reliability.

Method for manufacturing wafer level chip stack package

Growing community of inventors

Suwon-si, South Korea

Soon-Bum Kim