Lg Electronics Inc.

Samsung Electronics Co., Ltd.

Boehringer Ingelheim International Gmbh

Bristol-Myers Squibb Compnay

Leland Stanford Junior University

Soulbrain Co., Ltd.

Otsuka Pharmaceutical Company, Limited

Bristol Meyers Squibb Company

Enf Technology Co., Ltd.

Soojin Kim

Peter Nickolaus

Xudong Wei

Rogelio Perez Frutos

Ulrike Werthmann

Bing-Shiou Yang

Nitinchandra D Patel

Thomas Gabriel Tampone

Jason Alan Mulder

Chris Hugh Senanayake

Jack Z Gougoutas

Mary F Malley

Sushil K Srivastava

Martha Davidovich

Hyo-Sun Lee

Bruce T Lotz

Pascale A J Pouzet

Gahee Shin

Shanhui Fan

Hoon Hee Han

Hoyoung Kim

Tae Soo Kwon

Mark Luitzen Brongersma

Jung-Min Oh

Wonjae Joo

Jung Hun Lim

Chanwoo Lee

Jungbin Lee

Taeyong Kim

Jinhye Bae

Keonyoung Kim

Juhyung Kang

Jaecheol Kwak

Donghyun Kim

Myung Ho Lee

Woochan Kim

David S Thomson

Yongtae Kim

Youngbae Park

Hyosan Lee

Daniel Kuzmich

Todd Bosanac

Hossein Razavi

Fukang Yang

Michael Jason Burke

Qi Gao

Rajashekhar Betageri

Dongyoon Kim

Hayoung Jeon

Pingrong Liu

Jonathan Timothy Reeves

Soowon Park

Dongmin Kim

John Lord

Dongsoo Shin

Seongno Yoon

Yongjun An

Junghun Lim

San Kiang

Christian Harcken

Jongpil Lee

Haksoo Kim

Seogkyu Park

Aram Lee

Seungwoo Nam

Younggon Kim

Sunggi Hwang

Jongdeuk Bae

Thomas Wai-ho Lee

Pascale Arielle Jane-Josee Pouzet

Donggeun Kim

Chris Hugh Sananayake

Zhibin Li

Seungmin Jeon

Margaret M Gleeson

Donald C Kientzler

Kwanghyuk Lim

Inho Kang

Taejeong Seo

Byoungpyo Moon

Jung Jae Oh

The present document relates to a method by which a terminal transmits and receives a signal in a wireless communication system. Disclosed is a method for transmitting and receiving a signal, comprising the steps of: receiving a signal through a first slot from a base station; transmitting, to the base station, information including hybrid automatic repeat and request acknowledgment/negative-acknowledgement (HARQ-ACK/NACK) feedback for the signal through an uplink physical channel; and receiving, from the base station, channel configuration information on the basis of the information, wherein the information includes information on whether interference cancellation of the signal succeeds, whether or not the interference cancellation of the signal succeeds is determined for every slot, and the information is transmitted from a slot next to the first slot.

Method for transmitting and receiving data in wireless communication system supporting full duplex communication, and apparatus therefor

According to the present disclosure, a method for performing, by a user device, measurement report in a wireless communication system may include: receiving, by the user device, a measurement resource from a base station; performing measurement based on the measurement resource; and, transmitting a measurement report including a measurement result to the base station based on a result of the performing. Herein, the measurement report may include the measurement result and information indicating whether or not self-interference cancellation is successful.

Method and apparatus for performing handover in a wireless communication system

A method of transmitting and receiving a signal by a user equipment (UE) in a wireless communication system is disclosed. The method includes receiving downlink control information (DCI) including frequency allocation information from a base station (BS), identifying frequency bands allocated as an uplink (UL) band and a downlink (DL) band based on the frequency allocation information, and transmitting a UL signal through a transmitter of the UE based on the DCI. The transmitter of the UE includes an out-of-band emission reduction (OOBER) device, and the OOBER device is enabled based on whether the allocated frequency bands correspond to edges of a bandwidth part (BWP).

Method of transmitting and receiving data in wireless communication system supporting full-duplex radio and apparatus therefor

A method of transmitting and receiving a signal by a serving base station (BS) in a wireless communication system is disclosed. The method includes receiving, from a user equipment (UE), an uplink (UL) signal including a cell identifier (ID) of a first BS transmitting a downlink (DL) signal to the UE, determining whether the cell ID of the first BS is identical to a cell ID of the serving BS, transmitting a DL signal to the UE based on the cell ID of the first BS being identical to the cell ID of the serving BS, and transmitting information on the UL signal to the first BS based on the cell ID of the first BS being different from the cell ID of the serving BS. The UE supports full-duplex radio, and the UL signal includes a feedback for a DL signal transmitted by the first BS.

A method of transmitting and receiving a signal by a user equipment (UE) in a wireless communication system is disclosed. The method includes receiving, from a base station (BS), a capability enquiry message requesting a capability of the UE, transmitting, to the BS, a capability information message including information on the capability of the UE based on the capability enquiry message, and receiving, from the BS, resource allocation information for resource allocated based on the capability information message. The capability information message includes information indicating whether the UE supports full-duplex (FD) mode for at least one combination of a downlink (DL) channel and an uplink (UL) channel.

Embodiments of the inventive concepts provide a method of manufacturing a semiconductor device and a cleaning composition for an adhesive layer. The method includes preparing a semiconductor substrate to which an adhesive layer adheres, removing the adhesive layer from the semiconductor substrate, and applying a cleaning composition to the semiconductor substrate to remove a residue of the adhesive layer. The cleaning composition includes a solvent including a ketone compound and having a content that is equal to or greater than 40 wt % and less thaadminn 90 wt %, quaternary ammonium salt, and primary amine.

Method of manufacturing a semiconductor device and a cleaning composition for an adhesive layer

Provided are an etching composition and a method for manufacturing a semiconductor device using the same. According to embodiments, the etching composition may comprise from about 15 wt % to about 75 wt % of peracetic acid; a fluorine compound; an amine compound; and an organic solvent.

Etching composition and method for manufacturing semiconductor device using the same

A multi-stack graphene structure includes a graphene stack that includes graphene layers including amorphous graphene and thin film dielectric layers. The graphene layers include amorphous graphene. The graphene layers and the thin dielectric layers are alternately stacked on one another. The multi-stack graphene structure also includes an electric field former configured to apply an electric field to the graphene layers.

Multi-stack graphene structure and device including the same

A pre-treatment composition for use before etching SiGe includes an acid, an alcohol, and a silane compound having a chemical formula R&#x2014;Si(R)(OR)in which R is (C3-C20)alkyl, (C6-C12)aryl, (C6-C12)aryl(C3-C20)alkyl, or (C3-C20)alkyl(C6-C12)aryl, Ris hydrogen, hydroxyl, halogen, (C1-C20)alkyl, halo(C1-C20)alkyl, (C6-C12)aryl, (C6-C12)aryl(C1-C20)alkyl, or (C1-C20)alkyl(C6-C12)aryl, Ris hydrogen, (C1-C20)alkyl, halo(C1-C20)alkyl, (C6-C12)aryl, (C6-C12)aryl(C1-C20)alkyl, or (C1-C20)alkyl(C6-C12)aryl, n is an integer of 0 to 2, and the alkyl, aryl, arylalkyl, or alkylaryl of R, and the alkyl, haloalkyl, aryl, arylalkyl, or alkylaryl of Rmay be further substituted with at least one substituent selected from halogen, hydroxyl, &#x2014;N(R)(R), and &#x2014;S(R), where each of the R, the Rand the Ris independently hydrogen or (C1-C20)alkyl.

Pre-treatment composition before etching SiGe and method of fabricating semiconductor device using the same

Piperidino-dihydrothienopyrimidine sulfoxides of formula I wherein:

Piperidino-dihydrothienopyrimidine sulfoxides and their use for treating COPD and asthma

Embodiments of the inventive concepts provide a method of manufacturing a semiconductor device and a cleaning composition for an adhesive layer. The method includes preparing a semiconductor substrate to which an adhesive layer adheres, removing the adhesive layer from the semiconductor substrate, and applying a cleaning composition to the semiconductor substrate to remove a residue of the adhesive layer. The cleaning composition includes a solvent including a ketone compound and having a content that is equal to or greater than 40 wt % and less than 90 wt %, quaternary ammonium salt, and primary amine.

A mobile terminal and controlling method thereof are disclosed, by which restoration and backup operations are performed for the mobile terminal. For example, the mobile terminal includes a controller performing a backup operation and a restoration operation on the mobile terminal, the controller including an application module for activating a backup restoration application and at least one or more applications; and a Linux kernel module for managing a basic hardware function of the mobile terminal, the Linux kernel module including a backup restoration service unit having an access authority for accessing a file system of each of the at least one or more applications, wherein the backup restoration application accesses the file system of each of the at least one or more applications and then performs the backup and restoration operations on data of each of the at least one or more applications.

Mobile terminal and controlling method thereof

The laundry treating apparatus includes a door to open and close the introduction port about a first rotational or a second rotational axis which is different from first rotational axis. A first switching unit is provided in the door to allow rotation of door about the first rotational axis, and a second switching unit is provided in the door to allow rotation of the door about the second rotational axis. A lock fixes a position of at least one of the first switching unit or second switching unit when the door opens the introduction port. A damper is also provided. As can be appreciated, the mechanism used for the laundry apparatus may be applicable to other home appliances or non-home appliances where two different rotational axes may be needed to open and close a door.

Laundry treating apparatus

Growing community of inventors

Seoul, South Korea

Soojin Kim