Skhynix Inc.

Soo-Nam Jung

Sung-Lae Oh

Dong-Hyuk Kim

Tae-Sung Park

Chang-Woon Choi

Jung-Hoon Lee

Jin-Ho Kim

Chang-Man Son

Sang-Hyun Sung

Ji-Eun Joo

Ji-Hyun Choi

Seong-Hun Jung

Kwang-Hwi Park

Je-Hyun Choi

A semiconductor memory device includes a stacked structure including a plurality of conductive layers and a plurality of interlayer insulating layers, which are alternately stacked on a substrate; stepped grooves provided in the stacked structure, the stepped grooves having different depths from each other; and an opening portion penetrating the stacked structure to contact the substrate and having steps on sidewalls, the steps having heights corresponding to depth differences between stepped grooves.

Semiconductor memory device and manufacturing method thereof

A semiconductor memory device includes a memory chip defined with a first pad on one surface thereof; and a circuit chip defined with a second pad which is coupled with the first pad, on one surface thereof bonded with the one surface of the memory chip. The memory chip comprising: a memory cell array; a bit line disposed in a first wiring layer between the one surface and the memory cell array, and separated into a first bit line section and a second bit line section; and a power pad disposed in a space between the first bit line section and the second bit line section in the first wiring layer, and coupled with the first pad.

Semiconductor memory device of three-dimensional structure

A semiconductor device includes an internal circuit and a power mesh configured to transmit an operating voltage to the internal circuit. The power mesh includes first power lines extending in a first direction and arranged in a second direction intersecting with the first direction, when viewed from a top; second power lines sharing lanes with the first power lines and at least partially overlapping with the first power lines in the second direction; first power straps extending in the second direction and coupled to the first power lines; and second power straps extending in the second direction and coupled to the second power lines. Each of the first and second power lines may have a width of the same size as a width of each lane in sections where they do not overlap, and may have a width of a size smaller than the width of each lane in sections where they overlap.

Semiconductor device

A semiconductor memory device includes a cell wafer including a first plane and a second plane which are disposed to be adjacent to each other in a first direction and each include a plurality of memory cells; and a peripheral wafer including a row decoder which simultaneously controls the first and second planes and first and second page buffer circuits which control the first and second planes, respectively. The cell wafer includes, on one surface thereof bonded to the peripheral wafer, a first pad which is coupled in common with the first plane and the second plane, and the peripheral wafer includes, on one surface thereof bonded to the cell wafer, a second pad which is coupled with the row decoder and is bonded to the first pad.

Semiconductor memory device

A memory device includes a plurality of bit lines extending in a first direction and arranged in a second direction perpendicular to the first direction; a page buffer circuit including a plurality of page buffers which are electrically coupled to the plurality of bit lines; and a cache circuit including a plurality of caches which are electrically coupled to the plurality of page buffers, wherein the page buffer circuit is divided into a plurality of page buffer regions and is laid out at both sides of the cache circuit in the first direction.

Memory device

A semiconductor memory device includes a plurality of bit lines electrically coupled to a memory cell array and extending in a first direction; bit line contact pads formed on a first plane over a substrate and respectively coupled to the bit lines through bit line contacts; and first contact pads formed on the first plane, respectively coupled to the bit line contact pads through redistribution lines, and electrically coupled to a page buffer circuit which is disposed on the substrate, through first contacts, wherein at least two first contact pads corresponding to at least two bit line contact pads which are disposed in a line in a second direction crossing with the first direction are disposed in a line in the first direction.

A semiconductor memory device comprises a memory cell array disposed on a substrate, a plurality of bit lines disposed on the a memory cell array, each bit line extending in a first direction parallel to the top surface of the substrate and divided into a first bit line section and a second bit line section, and a plurality of source line pads disposed at the same layer as the bit lines between the first bit line sections of the bit lines and the second bit line sections of the bit lines.

A memory device includes a plurality of bit lines; a page buffer circuit including a plurality of page buffers which are electrically coupled to the plurality of bit lines; and a cache circuit including a plurality of caches which are electrically coupled to the plurality of page buffers, wherein a number of stages of the page buffer circuit is less than a number of stages of the cache circuit.

Memory device including page buffers

A semiconductor memory device includes a memory structural body including first and second planes each of which includes memory cells coupled to word lines extending in a first direction and bit lines extending in a second direction and which are disposed along the first direction; and a logic structural body disposed between a substrate and the memory structural body, and including a row decoder. The row decoder includes a pass transistor circuit which is coupled in common to the first and second planes and a block switch circuit which controls the pass transistor circuit. The block switch circuit is disposed in first and second plane regions of the logic structural body which overlap with the first and second planes in a third direction perpendicular to the first and second directions, and the pass transistor circuit is disposed in an interval region between the first and second plane regions.

A semiconductor memory device includes a logic structure including a peripheral circuit element which is formed over a substrate, a bottom dielectric layer which covers the peripheral circuit element and a bottom wiring line which is disposed in the bottom dielectric layer and is coupled to the peripheral circuit element; a memory structure stacked over the logic structure in a first direction perpendicular to a top surface of the substrate; a bit line disposed over a first top dielectric layer which covers the memory structure, extending in a second direction parallel to the top surface of the substrate, and divided into first and second bit line sections; and a power pad disposed over the first top dielectric layer between the first bit line section and the second bit line section, and coupled to the bottom wiring line through a power coupling contact which passes through the memory structure.

A semiconductor memory device includes first and second memory blocks each including conductive and dielectric layers alternately stacked over a semiconductor layer disposed over a substrate, and disposed adjacent to each other in a first direction; a dummy block disposed over the semiconductor layer, and provided between the first and second memory blocks; first pass transistors formed over the substrate below the first memory block, and coupled to conductive layers, respectively, of the first memory block; second pass transistors formed over the substrate below the second memory block, and coupled to conductive layers, respectively, of the second memory block; bottom global row lines between the first and second pass transistors and the semiconductor layer, and each coupled to one of the first pass transistors and one of the second pass transistors; and top global row lines formed over the dummy block, and coupled to the bottom global row lines.

Semiconductor memory device of three-dimensional structure including a dummy block

A memory device includes a substrate, channel structures disposed over the substrate and extending in a first direction perpendicular to a top surface of the substrate, a plurality of gate lines surrounding the channel structures and stacked over the substrate along the first direction, and a wiring line disposed at the same layer as at least one of the gate lines.

Wiring line structure of three-dimensional memory device

A memory device includes a memory cell array; bit lines including even and odd bit lines extending in a first direction and alternately disposed; cache latches including even cache latches which exchange data with the memory cell array through the even bit lines and odd cache latches which exchange data with the memory cell array through the odd bit lines; 2^k data lines, where k is a natural number equal to or greater than 2, respectively corresponding to 2^k input/output pins; and column merge units respectively allocated to the input/output pins, and each suitable for coupling any one of the even cache latches or any one of the odd cache latches to a data line corresponding to an input/output pin to which it is allocated. A pitch of the column merge units in a second direction intersecting the first direction is greater than a pitch of the cache latches.

A semiconductor memory device includes a peripheral circuit element provided over a lower substrate; an upper substrate provided over an interlayer dielectric layer which partially covers the peripheral circuit element; a memory cell array including a channel structure which extends in a first direction perpendicular to a top surface of the upper substrate and a plurality of gate lines which are stacked over the upper substrate to surround the channel structure; and a plurality of transistors electrically coupling the gate lines to the peripheral circuit element. The transistors include a gate electrode provided over the interlayer dielectric layer and disposed to overlap with the memory cell array in the first direction; a plurality of vertical channels passing through the gate electrode in the first direction and electrically coupled to the gate lines, respectively; and gate dielectric layers disposed between the vertical channels and the gate electrode.

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Seoul, South Korea

Soo-Nam Jung