Samsung Electronics Co., Ltd.

Song Woo Bae

Tae Hyun Kim

Sang Don Jang

Shiva Ram Krishna

Won Don Joo

Ji Young Chu

Maskless lithographic apparatus measuring accumulated amount of light is provided. The maskless lithographic apparatus includes a light source which emits light, a stage on which a substrate is disposed, an optical system which converts the light into a beam spot array including a plurality of columns and a plurality of rows and irradiates the beam spot array onto the stage, a slit to which the beam spot array is irradiated and which passes an nth (n is a natural number) row of the beam spot array, an optical sensor which senses the nth row of the beam spot array which has passed through the slit, and a measuring unit which measures an accumulated amount of light in the nth row of the beam spot array sensed by the optical sensor.

Growing community of inventors

Seoul, South Korea

Song Woo Bae