Samsung Electronics Co., Ltd.

Sol Han

Hyosan Lee

Kuntack Lee

Yongsun Ko

Byoungho Kwon

Sang Won Bae

Bo Yun Kim

Hongjin Kim

Sungoh Park

Boun Yoon

Jung-Min Oh

Kun-Tack Lee

Byoung-ho Kwon

Tae-Hong Kim

Ingi Kim

Jae-Kwang Choi

Yungjun Kim

Hong-Jin Kim

Keon-Sik Seo

Chae Lyoung Kim

A cleaning apparatus for removing particles from a substrate is provided. The cleaning apparatus includes a first cleaning unit including a first dual nozzle supplying, to a substrate, a first chemical liquid and a first spray including a first liquid dissolving the first chemical liquid, and a second cleaning unit including a second dual nozzle supplying, to the substrate, a second chemical liquid different from the first chemical liquid and a second spray including a second liquid dissolving the second chemical liquid and being the same as the first liquid.

Cleaning apparatus, chemical mechanical polishing system including the same, cleaning method after chemical mechanical polishing, and method of manufacturing semiconductor device including the same

An etching composition includes about 1 wt % to about 7 wt % of hydrogen peroxide, about 20 wt % to about 80 wt % of phosphoric acid, about 0.001 wt % to about 1 wt % of an amine or amide polymer, 0 wt % to about 55 wt % of sulfuric acid, and about 10 wt % to about 45 wt % of deionized water.

Etching composition

Etching composition and method of manufacturing semiconductor device using the same

A pad conditioning disk, a pre-conditioning unit, and a CMP apparatus having the same are provided. The pad conditioning disk includes a base in which mountain-type tips and valley-type grooves are repeatedly connected to each other, and a cutting layer formed on the base layer. The cutting layer including conditioning particles deposited on surfaces of the tips and grooves. A surfaces roughness of conditioning particles deposited on the surfaces of the tips is less than a surface roughness of conditioning particles deposited on the surfaces of the grooves.

Chemical mechanical polishing apparatus having pad conditioning disk and pre-conditioner unit

Growing community of inventors

Gyeonggi-do, South Korea

Sol Han