Sun Chemical Corporation

Soichiro Omizu

Juanita M Parris

Michael J Jurek

John Gerard Tiessen

Ramasamy Krishnan

Ralph Francis Arcurio

Carl S Weisbecker

Josie M Rosen

Alex Chudolij

Described herein is a polar non-aqueous dispersion comprising polar polymeric microparticles in a polar non-aqueous medium, the polar polymeric microparticles being insoluble in the medium and being produced by dispersion polymerization of vinyl monomers such as acrylate monomers in the medium in the presence of a polymeric acrylic stabilizer. Inks, coatings and overprint varnishes are formulated that employ the polar non-aqueous dispersion. Such inks, etc., exhibit superior chemical resistance properties, for example in one-part and two-part systems.

Polar functional non-aqueous acrylic dispersions

Described herein are depolymerized polystyrene resins derived from polystyrene source resins. The depolymerized polystyrene resins undergo a depolymerization in which chemical bonds are cleaved, producing depolymerized polystyrene resins of lower molecular weight. The polystyrene resins may be modified by chemical reaction with monomers, polymers, and oligomers, such as acrylates thereof. Also described are ink and coating compositions that include the depolymerized and modified polystyrene resins.

High molecular weight polystyrene in inks and coatings

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Aomori, Japan

Soichiro Omizu