Hitachi High-tech Corporation

Hitachi-high-technologies Corporation

Soichiro Matsunaga

Takashi Doi

Souichi Katagiri

Keigo Kasuya

Hajime Kawano

Kenji Tanimoto

Shuhei Ishikawa

Hideo Todokoro

Hiroshi Morita

Yasunari Sohda

Hiroyuki Ito

Minoru Yamazaki

Takashi Ohshima

Toshiaki Kusunoki

Tomihiro Hashizume

Makoto Sakakibara

Noriaki Arai

Kazuhiro Honda

Minoru Kaneda

Aki Takei

Daigo Komesu

Hiromitsu Seino

Erina Kawamoto

Tetsuya Sawahata

A decelerating electrode of an energy filter includes an electrode pair that has an opening and a cavity portion provided in a rotationally symmetrical manner with the center of the opening as the optical axis. Voltages with electric potentials that are substantially the same as that of a charged particle beam are independently applied to both sides of the decelerating electrode. When an electrical field protrudes into the cavity portion, a saddle point having the same electric potential as that of incident charged particles is formed inside the decelerating electrode. The saddle point acts as a high pass filter for incident charged particles at an energy resolution ofmV or less. By analyzing charged particles which have been energy-separated, it is possible to measure the energy spectrum and ΔE at the high resolution ofmV or less and to obtain an SEM/STEM image with a high resolution.

Energy filter, and energy analyzer and charged particle beam device provided with same

In an electron source including a suppressor electrode having an opening at one end portion thereof in a direction along a central axis and an electron emission material having a distal end protruding from the opening, the suppressor electrode further includes a receding portion receding to a position farther from the distal end of the electron emission material than the opening in the direction along the central axis at a position in an outer peripheral direction than the opening, and at least a part of the receding portion is disposed within a diameter of 2810 μm from a center of the opening. Accordingly, an electron source, an electron gun, and a charged particle beam device such as an electron microscope using the same, in which a machine difference in a device performance due to an axial shift between the electron emission material and the suppressor electrode is reduced, are implemented.

Electron source, electron gun, and charged particle beam device

The invention provides an electron beam apparatus that reduces a time required for an electron gun chamber to which a sputter ion pump and a non-evaporable getter pump are connected to reach an extreme high vacuum state. The electron beam apparatus includes an electron gun configured to emit an electron beam and the electron gun chamber to which the sputter ion pump and the non-evaporable getter pump are connected. The electron beam apparatus further includes a gas supply unit configured to supply at least one of hydrogen, oxygen, carbon monoxide, and carbon dioxide to the electron gun chamber.

Electron beam apparatus and method for controlling electron beam apparatus

To stabilize an emitted electron beam, a thermoelectric field emission electron source includes: an electron source having a needle shape; a metal wire to which the electron source is fixed and configured to heat the electron source; a stem fixed to an insulator and configured to energize the metal wire; a first electrode having a first opening portion and arranged such that a tip of the electron source protrudes from the first opening portion; a second electrode having a second opening portion; and an insulating body configured to position the first electrode and the second electrode such that a central axis of the first opening portion and a central axis of the second opening portion coincide with each other, and to provide electrical insulation between the first and second electrodes, so as to provide a structure that reduces an amount of gas released when the first electrode is heated.

Thermoelectric field emission electron source and electron beam application device

The invention provides an electron source including a columnar chip of a hexaboride single crystal, a metal pipe that holds the columnar chip of the hexaboride single crystal, and a filament connected to the metal pipe at a central portion. The columnar chip of the hexaboride single crystal is formed into a cone shape at a portion closer to a tip than a portion held in the metal pipe, and a tip end portion having the cone shape has a (310) crystal face. Schottky electrons are emitted from the (310) crystal face. According to the invention, it is possible to provide a novel electron source having monochromaticity, long-term stability of an emitter current, and high current density.

Electron source, method for manufacturing the same, and electron beam device using the same

In order to provide an electron gun capable of maintaining a small spot diameter of a beam converged on a sample even when a probe current applied to the sample is increased, a magnetic field generation sourceis provided with respect to an electron gun including: an electron source; an extraction electrodeconfigured to extract electrons from the electron source; an acceleration electrodeconfigured to accelerate the electrons extracted from the electron source; and a first coiland a first magnetic pathhaving an opening on an electron source side, the first coiland the first magnetic pathforming a control lens configured to converge an electron beam emitted from the acceleration electrode. The magnetic field generation source is provided for canceling a magnetic field, at an installation position of the electron source, generated by the first coiland the first magnetic path

Electron gun and electron beam application device

An object of the invention is to stably supply an electron beam from an electron gun, that is, to prevent variation in intensity of the electron beam. The invention provides a charged particle beam device that includes an electron gun having an electron source, an extraction electrode to which a voltage used for extracting electrons from the electron source is applied, and an acceleration electrode to which a voltage used for accelerating the electrons extracted from the electron source is applied, a first heating unit that heats the extraction electrode, and a second heating unit that heats the acceleration electrode.

Charged particle beam device

An embodiment is to provide a technique that continuously applies a certain amount of an electron beam to a sample by selecting a beam applied to the sample from an electron beam emitted from an electron source in a scanning electron microscope. A charged particle apparatus is configured, including: a mechanism that detects the distribution of electric current strength with respect to the emitting direction of an electron beam emitted from an electron source; a functionality that predicts a fluctuation of an electric current applied to a sample by predicting the distribution of the electric current based on the detected result; a functionality that determines a position at which a beam applied to the sample is acquired based on the predicted result; and a mechanism that controls a position at which a probe beam is acquired based on the determined result.

Charged particle beam apparatus

Growing community of inventors

Tokyo, Japan

Soichiro Matsunaga