Samsung Electronics Co., Ltd.

So-Yeon Yun

Chung-sam Jun

Ji-Hye Kim

Kwan-Woo Ryu

Hwan-Shik Park

Jang-Ik Park

Kong-Jung Sa

Apparatus and method for manufacturing a semiconductor device through a layer material dimension analysis increase productivity. The method includes performing a semiconductor manufacturing process of at least one reference substrate and at least one target substrate in a semiconductor process device, detecting a reference spectrum and a reference profile for the reference substrate, determining a relation function between the detected reference spectrum and reference profile, detecting a real-time spectrum of the target substrate, and determining in real time a real-time profile of the target substrate processed in the semiconductor process device by using the detected real-time spectrum as a variable in the determined relation function.

Growing community of inventors

Hwaseong-si, South Korea

So-Yeon Yun