Rohm and Haas Electronic Materials Korea Ltd.

Jw Creagene Inc.

Samsung Sdi Co., Inc.

So-Yeon Kim

Yoon Sung Lee

Hye-Won Lee

Jihoon Kang

Jae Hwan Sim

Jae-Bong Lim

Jae-Man Choi

Jung Kyu Jo

Min-Sang Song

Yong-Soo Bae

Young-Min Choi

Young-Mok Kim

Seung-Soo Han

Jun-Han Yun

Kyu-Sung Park

Gue-Sung Kim

Ryoung-Hee Kim

Won-Chang Choi

An anti-reflective coating composition is provided. The anti-reflective coating composition of the present invention can be useful in preventing a pull-back phenomenon in which an anti-reflective coating layer tears on a corner of a pattern of a substrate during a heat curing process and improving gap-filling performance of the pattern since a crosslinker is attached to a polymer in the composition and the content of the low-molecular-weight crosslinker in the composition is minimized to regulate a heat curing initiation temperature.

Organic bottom antireflective coating composition for nanolithography

The present invention relates to a method for preparing a dendritic cell, a dendritic cell prepared thereby and a use thereof, and more specifically, to a method for preparing a dendritic cell, including: treating a dendritic cell at a maturation stage rather than at an immature stage with an antigen bound to a peptide having a cell membrane permeability to prepare a dendritic cell with improved antigen-presenting ability, a dendritic cell prepared by the method, and an immunotherapeutic agent thereof, a use for anti-tumor vaccines, or a pharmaceutical composition for treating tumors, containing the same.

Method for preparing dendritic cell, dendritic cell prepared thereby, and use thereof

Growing community of inventors

Gyeonggi-do, South Korea

So-Yeon Kim