Cambrios Film Solutions Corporation

Siou-Cheng Lien

Chung-Chin Hsiao

Chia-Yang Tsai

Yi-Wen Chiu

Shu-Ping Hsu

Chi-Fan Hsiao

Kang-Yu Liu

Wei-Na Cao

Ko-Hsin Chang

Cheng-Yuan Hsu

Jen-Yu Yew

A transparent heat-insulating film is provided, wherein the transparent heat-insulating film includes a base layer including a first surface and a second surface, a hard-coat layer, a silver nanowire layer, and a protective layer including an inner surface and an outer surface. The hard-coat layer and the silver nanowire layer are disposed between the first surface of the base layer and the inner surface of the protective layer. A temperature of the second surface of the base layer is T1 (&#xb0; C.), a temperature of the outer surface of the protective layer is T2 (&#xb0; C.), and a temperature difference between T1 and T2 (T1&#x2212;T2) is &#x394;T. When T1=50-100&#xb0; C. and the base layer and the protective layer reach thermal equilibrium, &#x394;T=0.15T1&#x2212;0.35T1.

Transparent heat-insulating film

A stacking structure includes a substrate, a silver nanowire layer provided on a top of the substrate, and a metal layer provided on a top of the silver nanowire layer. The silver nanowire layer includes a plurality of silver nanowires and an indium tin oxide (ITO) covered on the plurality of silver nanowires. The silver nanowire layer has an overall thickness that is 2.35 to 24 times as thick as a thickness of the ITO. A touch sensor including the above described stacking structure is also disclosed.

Stacking structure and touch sensor using same

A photosensitive electrically conductive structure includes: a substrate; a releasing photosensitizing resin layer disposed on the substrate; a nano silver layer disposed on the releasing photosensitizing resin layer; and a photosensitive electrically conductive layer disposed on an edge of the nano silver layer. A visible region is defined in the photosensitive electrically conductive structure where the nano silver layer is not covered by the photosensitive electrically conductive layer and a peripheral wiring region is defined in the photosensitive electrically conductive structure where the nano silver layer is covered by the photosensitive electrically conductive layer. The releasing photosensitizing resin layer has an average molecular weight (Mn) greater than 3,000 but less than 100,000, and the releasing photosensitizing resin layer, the nano silver layer, and the photosensitive electrically conductive layer are patterned. A touch sensor includes at least one layer of the photosensitive electrically conductive structure.

Photosensitive electrically conductive structure and touch sensor

A stack structure includes: a substrate, a copper layer disposed on the substrate, a migration-proof layer disposed on the copper layer, and a silver-nanowire layer disposed on the migration-proof layer, wherein the migration-proof layer is made of materials between copper and silver in galvanic series. A touch sensor includes the stack structure.

Stack structure and touch sensor

A transparent conductive film and method for making transparent conductive film and touch panel are disclosed. The transparent conductive film includes a substrate and a conductive mesh film. The substrate has a first surface. The conductive mesh film is formed on the first surface of substrate, and the conductive mesh film includes a plurality of silver nanowires. The conductive mesh film includes a plurality of meshes, and the meshes comprise a plurality of traces and a plurality of blank areas. The sheet resistance of the conductive mesh film is 5 &#x3a9;/sq to 30 &#x3a9;/sq, the width of each of the traces is 1 &#x3bc;m to 10 &#x3bc;m, and a transparency of the conductive mesh film to visible light is greater than 85%.

Transparent conductive film, manufacturing method of a transparent conductive film and touch panel

The touch panel includes the substrate, the first touch sensing electrode, the second touch sensing electrode, and the insulating layer. A first peripheral wire and a second peripheral wire are located at a peripheral area of the substrate. A first touch sensing electrode layer includes a first portion of a patterned first metal nanowire layer. The peripheral area includes a co-etched conductive layer and a second portion of the patterned first metal nanowire layer. The conductive layer and the second portion of the patterned first metal nanowire layer have a co-etched surface. The second touch sensing electrode is formed above the insulating layer and is connected with the second peripheral wire. The insulating layer may be made of a low dielectric constant material.

Touch panel and manufacturing method thereof

A touch panel includes a substrate, first and second touch sensing electrodes, and first and second traces. The substrate includes a display area and a peripheral area. The first and second touch sensing electrodes are formed on the display area, and the first and second traces are formed on the peripheral area. The first touch sensing electrode is formed by a first portion of a metal nanowire layer, which is patterned. The peripheral trace includes a conductive layer and a second portion of the metal nanowire layer, both of which are patterned in a co-etch step. The conductive layer and the second portion of the metal nanowire layer have a coplanar etched surface. The second touch sensing electrode is formed on an insulating layer and connects with the second trace.

An electrode structure and a touch panel including the electrode structure are provided. The electrode structure includes a membrane layer and a metallic nanowires layer having metallic nanowires. A first portion of the metallic nanowires layer is covered by the membrane layer, and a second portion of the metallic nanowires layer is exposed out of the membrane layer. The membrane layer is made of a copolymer formed by mixing two or more materials having different functional groups.

Electrode structure and touch panel thereof

A patterning process for forming a double-sided electrode structure includes: providing a substrate having two opposite surfaces, wherein a first photo-sensitive layer and a second photo-sensitive layer are respectively formed on the opposite surfaces; forming a first metal nanowire layer on the first photo-sensitive layer and a second metal nanowire layer on the second photo-sensitive layer; and performing a double-sided lithography process. The lithography process includes: performing an exposure process to define a removing area and a remaining area on both of the first and the second photo-sensitive layers; and removing the first and second photo-sensitive layers and the first and second metal nanowire layers in the defined removing areas by a developer solution, thereby patterning the first and second metal nanowire layers.

Double-sided electrode structure and patterning process thereof

A touch sensing panel includes a substrate, a touch sensing electrode, an etching-inhibition unit, and a peripheral trace. The substrate includes a touch sensing area and a peripheral area. The touch sensing electrode and the peripheral trace are respectively formed on the touch sensing area and the peripheral area, and the etching-inhibition unit is at least formed on the touch sensing area. The touch sensing electrode is electrically connected with the peripheral trace and includes a first part of a metal nanowire layer, which is patterned. The peripheral trace includes a metal layer and a second part of the metal nanowire layer. The metal layer directly contacts the second part of the metal nanowire layer. The metal layer and the second part of the metal nanowire layer have a co-planar etch-surface.

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Toufen, Taiwan

Siou-Cheng Lien