Sony Semiconductor Solutions Corporation

Sony Corporation

Sony Semiconductor Solutions Cororation

Sintaro Nakajiki

Yukihiro Sayama

Yuka Nakamoto

Nobuyuki Ohba

Yoshinori Toumiya

Tadayuki Dofuku

Yuichi Seki

Toyomi Jinwaki

Masanori Harasawa

The present technology relates to a solid-state imaging device, a manufacturing method, and an electronic device, which can improve sensitivity while improving color mixing. The solid-state imaging device includes a first wall provided between a pixel and a pixel arranged two-dimensionally to isolate the pixels, in which the first wall includes at least two layers including a light shielding film of a lowermost layer and a low refractive index film of which refractive index is lower than the light shielding film. The present technology can be applied to, for example, a solid-state imaging device, an electronic device having an imaging function, and the like.

Solid-state imaging device, manufacturing method thereof, and electronic device

The present technology relates to a solid-state imaging apparatus capable of suppressing occurrence of color mixing, a method for manufacturing the solid-state imaging apparatus, and an electronic device. The solid-state imaging apparatus includes a plurality of pixels arranged in a pixel region. Each of the pixels has: a first optical filter layer disposed on a photoelectric conversion unit; a second optical filter layer disposed on the first optical filter layer; and a separation wall separating at least a part of the first optical filter layer for each of the pixels. Either the first optical filter layer or the second optical filter layer in at least one of the pixels is formed by an infrared cut filter, while the other is formed by a color filter. The present technology can be applied to a CMOS image sensor including a visible light pixel.

Solid-state imaging apparatus, method for manufacturing the same, and electronic device

Provided is an image pickup element, including: condenser lenses made of a resin containing fine metal particles; photoelectric conversion elements formed in a silicon substrate and each configured to photoelectrically convert incident light that enter from an outside through corresponding one of the condenser lenses; and a protective film made of a silicon compound, the protective film being formed between the condenser lenses and the silicon substrate.

Image pickup element, imaging apparatus, manufacturing apparatus for image pickup element, and manufacturing method for image pickup element

A solid-state imaging device including a plurality of pixels arranged two-dimensionally, wherein each of the pixels has at least a planarizing film formed on the upper side of a photoelectric conversion element, a filter formed on the upper side of the planarizing film, and a microlens formed on the upper side of the filter. The filter of some of the pixels is a color filter permitting transmission therethrough of light of a predetermined color component, whereas the filter of other pixels is a white filter permitting transmission therethrough of light in the whole visible spectral range. The refractive indices of the white filter, the microlens and the planarizing film have the following relationship: (Refractive index of white filter)&#x2267;(Refractive index of microlens)&#x3e;(Refractive index of planarizing film).

Solid-state imaging device with pixels having white filter, microlens and planarizing film refractive indices in predetermined relationship

Growing community of inventors

Kumamoto, Japan

Sintaro Nakajiki