Hitachi, Ltd.

Hitachi Vlsi Engineering Corp.

Hitachi Ulsi Systems Co., Ltd.

Other

Hitachi Ulsi Engineering Corp.

Hitachi Hokkai Semiconductor Ltd.

Hitachi Vsli Engineering Corp.

Sinichi Miyatake

Makoto Morino

Hiroshi Yoshioka

Shinji Udo

Mitsuhiro Takano

Manabu Tsunozaki

Kazuhiko Kajigaya

Masashi Horiguchi

Akira Endo

Ryoichi Hori

Takashi Yamazaki

Kazuyoshi Oshima

Kazuyuki Miyazawa

Jun Etoh

Yuji Sakai

Yasunori Yamaguchi

Tetsurou Matsumoto

Yasuhiro Kasama

Shinichi Ikenaga

Eiji Miyamoto

Jiro Sawada

Hirokazu Saito

Atsushi Kumata

Yoshihisa Koyama

Hidetomo Aoyagi

Shoji Kubono

Masaya Muranaka

Yukihide Suzuki

Shoji Wada

Masahiro Ogata

Kanehide Kenmizaki

Kyoko Ishii

Tetsuya Kitame

Masahiro Katayama

Hiromi Tsukada

Nobuhiko Ohno

Kazuo Mihashi

Koichi Nozaki

Akihiko Hoshida

Shouji Wada

Nobuo Komatsu

Seiichi Shundo

A semiconductor memory device formed on a semiconductor chip includes first memory arrays, a plurality of second memory arrays, a first voltage generator, and first bonding pads. The semiconductor chip is divided into first, second and third rectangle regions and the third rectangle region is arranged between the first rectangle region and the second rectangle region. The first memory arrays are formed in the first rectangle region. The second memory arrays are formed in the second rectangle region. The voltage generator and first bonding pads are arranged in the third rectangle region. The first bonding pads are arranged between the first rectangle region and the voltage generator and no bonding pads are arranged between the voltage generator and the second memory arrays.

Semiconductor memory device and defect remedying method thereof

A semiconductor memory device formed on a semiconductor chip comprises a plurality of first memory arrays, a plurality of second memory arrays, a first voltage generator, and a plurality of first bonding pads. The semiconductor chip is divided into a first rectangle region, a second rectangle region, and a third rectangle region and the third rectangle region is arranged between the first rectangle region and the second rectangle region. The plurality of first memory arrays are formed in the first rectangle region. The plurality of second memory arrays are formed in the second rectangle region. The voltage generator and the plurality of first bonding pads are arranged in the third rectangle region. The plurality of first bonding pads are arranged between the first rectangle region and the voltage generator and no bonding pads are arranged between the voltage generator and the plurality of second memory arrays.

A semiconductor memory device, in which peripheral circuits are arranged in a cross area of a semiconductor chip composed of the longitudinal center portions and the transverse center portions, and in which memory arrays are arranged in the four regions which are divided by the cross area. This structure in which the peripheral circuits are arranged at the center portion of the chip permits the longest signal transition paths to be shortened to about one half of the chip size to speed up the DRAM which is intended to have a large storage capacity.

A semiconductor memory device, in which peripheral circuits are arranged in a cross area of a semiconductor chip composed of the longitudinal center portions and the transverse center portions, and in which memory arrays are arranged in the four regions which are divided by the cross area. A benefit of this structure in which the peripheral circuits are arranged at the center portion of the chip, is that the longest signal transmission paths can be shortened to about one half of the chip size to speed up the DRAM which is intended to have a large storage capacity.

Semiconductor device formed in a rectangle region on a semiconductor substrate including a voltage generating circuit

Herein disclosed is a semiconductor memory device, in which peripheral circuits are arranged in a cross area of a semiconductor chip composed of the longitudinal center portions and the transverse center portions, and in which memory arrays are arranged in the four regions which are divided by the cross area. Thanks to this structure in which the peripheral circuits are arranged at the center portion of the chip, the longest signal transmission paths can be shortened to about one half of the chip size to speed up the DRAM which is intended to have a large storage capacity.

Semiconductor memory device having zigzag bonding pad arrangement

A defect remedy LSI mounted on a memory module, comprising: an input interface portion for capturing address and control signals, the input interface portion being the same as that of a dynamic RAM; an input/output interface portion corresponding to a data bus of a memory device comprised of a plurality of dynamic random access memories; a memory circuit to which a chip address and an X defective address of any of the plurality of random access memories are electrically written, the memory circuit being substantially made nonvolatile; a redundancy remedy RAM portion composed of a static RAM wherein a word line is selected by a compare match signal between an X address signal and the defective address of the memory circuit, the X address signal and the defective address being captured via the input interface portion, and a column is selected by a Y address signal captured via the input interface portion; a selecting portion for connecting a data input/output bus of the redundancy remedy RAM portion to an input/output circuit corresponding to a defective chip address; a data input/output portion for selectively activating an input/output circuit to be connected to a data bus corresponding to a dynamic RAM found defective; and a mask portion for outputting a control signal for putting in a high-impedance state an output pin of the defective RAM in a read operation.

Semiconductor memory system

Growing community of inventors

Tokyo, Japan

Sinichi Miyatake